2013
DOI: 10.5936/csbj.201303002
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Tribology of Bio-Inspired Nanowrinkled Films on Ultrasoft Substrates

Abstract: Biomimetic design of new materials uses nature as antetype, learning from billions of years of evolution. This work emphasizes the mechanical and tribological properties of skin, combining both hardness and wear resistance of its surface (the stratum corneum) with high elasticity of the bulk (epidermis, dermis, hypodermis). The key for combination of such opposite properties is wrinkling, being consequence of intrinsic stresses in the bulk (soft tissue): Tribological contact to counterparts below the stress th… Show more

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Cited by 12 publications
(7 citation statements)
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References 45 publications
(57 reference statements)
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“…Deposition is the most commonly applied process during the fabrication of thin films. According to the thin-film forming mechanism, deposition can be classified into chemical vapor deposition (CVD), such as low pressure CVD [38] and plasma enhanced CVD (PECVD) [39], and physical vapor deposition such as sputtering deposition [40][41][42], ion beam sputtering [43,44], thermal evaporation [45,46], pulsed laser deposition (PLD) [47,48], etc. This review mainly focuses on sputtering deposition and some other deposition processes are also proposed.…”
Section: Effects Of Different Deposition Parameters On the Surface Ro...mentioning
confidence: 99%
“…Deposition is the most commonly applied process during the fabrication of thin films. According to the thin-film forming mechanism, deposition can be classified into chemical vapor deposition (CVD), such as low pressure CVD [38] and plasma enhanced CVD (PECVD) [39], and physical vapor deposition such as sputtering deposition [40][41][42], ion beam sputtering [43,44], thermal evaporation [45,46], pulsed laser deposition (PLD) [47,48], etc. This review mainly focuses on sputtering deposition and some other deposition processes are also proposed.…”
Section: Effects Of Different Deposition Parameters On the Surface Ro...mentioning
confidence: 99%
“…Intrinsic film growth stresses were found in the range of -0.8 (MS) and -2.34 GPa (DD) on Si [18,19]. Reasonably, relaxation of such high compressive stresses occurs continuously during thin film growth in vacuum by a common deformation of film and substrate ("nano-wrinkling") [6][7][8]. These wrinkled topographies for DLC on PET and PC are well visible in Fig.…”
Section: Resultsmentioning
confidence: 59%
“…We found recently wrinkling mechanisms during deposition of hard thin films on soft substrates due to high intrinsic growth stresses in such films. Wrinkling reduces the film stresses by geometric deformation forming nano-to micrometer scaled topographies with a wavelength dependent on the film thickness [6][7][8].…”
Section: Introductionmentioning
confidence: 99%
“…1c and e). However, this sub-micrometer wrinkling is mechanically limited by stiffening of the surface by the growing film thickness, which either may crack or enlarge the wrinkle wavelength for stress release (see detailed explanations in [20]). Most of formed cracks are able to heal during ongoing deposition, resulting in elongated tops [7], and only a few are visible after deposition.…”
Section: Methodsmentioning
confidence: 99%