Tribological behavior of HFCVD multilayer diamond film on silicon carbide

Pu, Leiwu; Sun, Fei; He, Ping; Zhu, Qunzhi; Ren, Jianxing

doi:10.1016/j.surfcoat.2015.04.023

Cited by 26 publications

(11 citation statements)

References 33 publications

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“…Silicon nitride (Si 3 N 4 ) is a well‐known technical ceramic of high performance due to its high hardness, toughness, strength, chemical stability, and wear resistance . These properties allow the use of Si 3 N 4 in various industrial applications, such as cutting tools, mechanical seals, ball and roller bearings, or turbine components . Chemical vapor deposition (CVD) of nanocrystalline diamond (NCD) films on such ceramic substrates allows enhancing its tribological behavior due to the small grain size combined with excellent mechanical properties, especially high hardness, low friction coefficient and high wear resistance .…”

Section: Introductionmentioning

confidence: 99%

Low‐temperature deposition of nanocrystalline diamond films on silicon nitride substrates using distributed antenna array PECVD system

Baudrillart

Bénédic

Melouani

et al. 2016

Physica Status Solidi (a)

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The growth of nanocrystalline diamond (NCD) films on Si 3 N 4 ceramic substrates at low surface temperature using a distributed antenna array plasma-enhanced chemical vapor deposition (PECVD) process is investigated. The advantage of the considered deposition process for keeping a low growth temperature is demonstrated through microwave electric field simulation and comparisons with microwave cavity systems. The suitable design of the low-pressure distributed antenna array reactor thus prevents the ceramic substrate from overheating and consequently from film graphitization. Therefore, for the first time NCD/Si 3 N 4 tribosystems are achieved for deposition temperature in the range 250-400 8C. The nature of the ex situ pretreatment carried out on Si 3 N 4 ceramics in order to favor diamond nucleation, as well as temperature variation in the considered range, do not significantly influence the morphology, topography, composition, and microstructure of the NCD films, the characteristics of which remain very close to those of films deposited on Si substrates under the same conditions. Only the growth rate decreases by a factor of two, down to 15-17 nm h À1 , when the deposition temperature diminishes from 400 to 250 8C. This behavior is attributed to an activation energy almost substrate-independent estimated in the range 3.24-3.57 kcal mol À1 for the considered low-temperature and low-pressure NCD deposition process using a H 2 /CH 4 / CO 2 gas mixture.

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Section: Introductionmentioning

confidence: 99%

Low‐temperature deposition of nanocrystalline diamond films on silicon nitride substrates using distributed antenna array PECVD system

Baudrillart

Bénédic

Melouani

et al. 2016

Physica Status Solidi (a)

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“…Each type of film has its own particularities and, so, a multilayer coating can be adopted (MCD/NCD), attaining the best of both types and, comparatively with monolayer coatings, are proven to have better adhesion and lower internal tensions [9]. The first deposited layer was an MCD film (with good adhesion and strength) and the second one was an NCD layer (with smaller crystals) to improve the mechanical characteristics of the coating (surface smoothness).…”

Section: Coatings 2018 8 X For Peer Review 2 Of 13mentioning

confidence: 99%

“…A multilayer film (microcrystalline/nanocrystalline) was adopted in order to retain the best characteristics of each layer, the high fracture strength and good adhesion of microcrystalline diamond (MCD) films, and the low surface roughness of nanocrystalline diamond (NCD) films, ensuring the best performance under demanding tribological applications [9][10][11].…”

Section: Introductionmentioning

confidence: 99%

HFCVD Diamond-Coated Mechanical Seals

et al. 2018

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A mechanical seal promotes the connection between systems or mechanisms, preventing the escape of fluids to the exterior. Nonetheless, due to extreme working conditions, premature failure can occur. Diamond, due to its excellent properties, is heralded as an excellent choice to cover the surface of these devices and extend their lifetime. Therefore, the main objective of this work was to deposit diamond films over mechanical seals and test the coated seals on a water pump, under real working conditions. The coatings were created by hot filament chemical vapor deposition (HFCVD) and two consecutive layers of micro-and nanocrystalline diamond were deposited. One of the main difficulties is the attainment of a good adhesion between the diamond films and the mechanical seal material (WC-Co). Nucleation, deposition conditions, and pre-treatments were studied to enhance the coating. Superficial wear or delamination of the film was investigated using SEM and Raman characterization techniques, in order to draw conclusions about the feasibility of these coatings in the WC-Co mechanical seals with the purpose of increasing their performance and life time. The results obtained gave a good indication about the feasibility of this process and the deposition conditions used, with the mechanical seals showing no wear and no film delamination after a real work environment test.

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“…Hence, considering that MCD film and NCD film can complement each other, multilayer technique is designed with MCD film as bottom layer and NCD film as top layer [16][17][18]. Recent studies have showed that the multilayer structure has superior friction performance, critical load and adhesion strength compared to monolayer structure [19][20][21][22][23].…”

Section: Introductionmentioning

confidence: 99%

Effect of bottom micro-crystalline diamond (MCD) layer and top nano-crystalline diamond (NCD) layer onto the tribological behavior of (MCD/NCD) bilayer film

Luo

et al. 2020

Mater. Res. Express

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In this study, a comparative study of a series of (MCD/NCD) bilayer films with different MCD grain sizes and NCD layer thickness deposited on cemented tungsten carbide (WC-Co) flat substrates was conducted by changing the deposition time. Tribological behaviors of these diamond films were evaluated by using a reciprocal tribometer without lubrication. In friction test against Si 3 N 4 balls, the (3hMCD/6hNCD) bilayer film showed the lowest coefficient of friction (0.059) and wear rates of counterpart balls (1.75×10 −6 mm 3 N −1 m −1 ) because of its lowest surface roughness and higher sp 2 content. This work provides a guide to choose suitable (MCD/NCD) bilayer basic structure in multilayer diamond film for getting a fine diamond film with low roughness and great tribological performance for different applications.

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Tribological behavior of HFCVD multilayer diamond film on silicon carbide

Cited by 26 publications

References 33 publications

Low‐temperature deposition of nanocrystalline diamond films on silicon nitride substrates using distributed antenna array PECVD system

Low‐temperature deposition of nanocrystalline diamond films on silicon nitride substrates using distributed antenna array PECVD system

HFCVD Diamond-Coated Mechanical Seals

Effect of bottom micro-crystalline diamond (MCD) layer and top nano-crystalline diamond (NCD) layer onto the tribological behavior of (MCD/NCD) bilayer film

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