Abstract:The transport properties across La 2/3 Ca 1/3 MnO 3 / SrTiO 3 ͑LCMO/STO͒ heterostructures with different thicknesses of the STO insulating barrier have been studied by using atomic force microscopy measurements in the current sensing ͑CS͒ mode. To avoid intrinsic problems of the CS method we have developed a nanostructured contact geometry of Au dots. The conduction process across the LCMO/STO interface exhibits the typical features of a tunneling process. The analysis of I͑V͒ curves by using the Simmons model… Show more
“…Jain et al 107 2) the height of the barrier, E=0.4 eV. 108 The latter value was very close to the obtained in barriers of STO deposited by PLD 110 , demonstrating that ultra-thin layers of LCO prepared by PAD retained a good insulator character and can be used as tunneling barriers in combination with LSMO at room temperature.…”
Section: Control Of Stoichiometry and Thickness Over Large Areassupporting
confidence: 57%
“…This is an important drawback for the stacking of these materials in a multilayer heterostructure. However, c-axis oriented single phase of nominal composition of Ca 115 The growth of the ordered structure from the substrate interface is due to the bottom-up slow crystallization of an epitaxial rock-salt layer on top of the LAO substrate, with a relationship (001) BiORS||(001)LAO; [110]BiORS ||[100]LAO. Int.…”
Section: Thermodynamic Stabilization Of Complex Oxidesmentioning
Chemical solution methods for thin-film deposition constitute an affordable alternative to high-vacuum physical technologies, like Sputtering, Pulsed Laser Deposition (PLD) or Molecular Beam Epitaxy (MBE).
“…Jain et al 107 2) the height of the barrier, E=0.4 eV. 108 The latter value was very close to the obtained in barriers of STO deposited by PLD 110 , demonstrating that ultra-thin layers of LCO prepared by PAD retained a good insulator character and can be used as tunneling barriers in combination with LSMO at room temperature.…”
Section: Control Of Stoichiometry and Thickness Over Large Areassupporting
confidence: 57%
“…This is an important drawback for the stacking of these materials in a multilayer heterostructure. However, c-axis oriented single phase of nominal composition of Ca 115 The growth of the ordered structure from the substrate interface is due to the bottom-up slow crystallization of an epitaxial rock-salt layer on top of the LAO substrate, with a relationship (001) BiORS||(001)LAO; [110]BiORS ||[100]LAO. Int.…”
Section: Thermodynamic Stabilization Of Complex Oxidesmentioning
Chemical solution methods for thin-film deposition constitute an affordable alternative to high-vacuum physical technologies, like Sputtering, Pulsed Laser Deposition (PLD) or Molecular Beam Epitaxy (MBE).
“…This problem is overcome using the nanostructured contact geometry so that injected current depends only on the size of the Au dots. Conductive AFM measurements using contact geometry have been achieved so far in Au/LCMO interfaces fabricated by sputtering. − …”
We report magnetic and electronic transport measurements across epitaxial bilayers of ferromagnetic insulator LaCoO3 and half-metallic ferromagnet La2/3Sr1/3MnO3 (LCO/LSMO: 3.5 nm/20 nm) fabricated by a chemical solution method. The I-V curves at room temperature and 4K measured with conducting atomic force microscopy (CAFM) on well-defined patterned areas exhibit the typical features of a tunneling process. The curves have been fitted to the Simmons model to determine the height (φ) and width (s) of the insulating LCO barrier. The results yield φ = 0.40 ± 0.05 eV (0.50 ± 0.01 eV) at room temperature (4K) and s = 3 nm, in good agreement with the structural analysis. Our results demonstrate that this chemical method is able to produce epitaxial heterostructures with the quality required for this type of fundamental studies and applications.
“…The energy of UV light is ~ 4.48 eV which is higher than the barrier height of LCMGO/Si p-n junction. The barrier height of LCMGO/Si p-n junction is ~3.9 eV, calculated using ø0=WLCMGO− øSi [26]. Where, WLCMGO is the work function of the LCMGO (~ 4.88 eV) and øSi is the electron affinity of Si (~0.9 eV).…”
Section: Resultsmentioning
confidence: 99%
“…There are various theoretical models and mechanisms available to understand the charge transport behaviour of the materials, thermionic emission: I = AT 2 exp (-[{ΦBq (qV / 4πεd) 1/2 } /KT] [14], hopping conduction mechanism: I α V [14], Space Charge Limited conduction (SCLC) mechanism: ISCLC = 9μεrε0θ V 2 /8d 3 [26], (iv) Schottky barrier: I = AT 2 exp (-[ψ-(q 3 V / 4πε0k) 1/2 / KBT [21], and (v) Simmons model : I α V n [27] etc. The Simmons model is best fitted in reverse bias mode of I-V characteristics for all the grown thin films.…”
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