Transport of a Macroparticle in Vacuum Arc Sheath

Bizyukov, A. A.; Гірка, І. О.; Romashchenko, E.V.

doi:10.1109/tps.2016.2573284

Cited by 3 publications

(2 citation statements)

References 17 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…We have recently considered the application of negative DC biasing for the decreasing of MP contamination in vacuum arc deposition [12,13]. The proposed model was based on combination of MP charging model and steady-state sheath model.…”

Section: Introductionmentioning

confidence: 99%

Effect of Pulsed Substrate Biasing on Macroparticle in Vacuum Arc

Romashchenko¹,

Bizyukov²,

Гірка³

2019

Problems of Atomic Science and Technology

View full text Add to dashboard Cite

An analytical model of the interaction of macroparticle (MP) with vacuum arc plasma in plasma immersion ion implantation (PIII) is presented. The proposed model is based on combination of the theory of charge dynamics of MP and sheath model for PIII. In the framework of this model, the MP charge dynamics during voltage pulse as well as during interval between pulses is investigated. It is obtained that MP charge and MP behavior depend on pulsed bias parameters such as pulse duration, duty cycle and bias amplitude. It is shown that pulsed substrate biasing is effective method to control of the MPs in plasma processing.

show abstract

Section: Introductionmentioning

confidence: 99%

Effect of Pulsed Substrate Biasing on Macroparticle in Vacuum Arc

Romashchenko¹,

Bizyukov²,

Гірка³

2019

Problems of Atomic Science and Technology

View full text Add to dashboard Cite

show abstract

“…The experimental observations reveal that the number of MPs can be reduced by substrate biasing [7]. We have recently considered the effect of negative substrate biasing on MP contamination in vacuum arc deposition (VAD) [8]. The energy of multiply charged ions at the substrate is increased by applying a negative bias.…”

mentioning

confidence: 99%

Macroparticle Reflection from a Biased Substrtate in Plasma Ion Implantation Systems

Romashchenko

Bizyukov

Гірка

2020

EEJP

View full text Add to dashboard Cite

Generation of metal plasma in vacuum arc discharge is always accompanied by a production of macroparticles (MPs). The MP contamination in coatings is the most important technological problem in plasma immersion ion implantation (PIII). For the case of PIII with long pulse duration, the results of theoretical study of MP charging and dynamics in the plasma sheath are presented. To describe the MP charging in the sheath the sheath model is combined with orbital motion limited (OML) theory. The MP charging in the sheath is studied with taking into account emission processes from MP surface as well as kinetic electron emission (KEE) from the high voltage substrate. The charge and dynamics of MP are governed by local parameters of counter fluxes of ions and secondary electrons from the substrate. The MP charge depends on the MP local position within the sheath. The dominant role in MP charging is shown to be played by KEE from the substrate, which is an important feature of PIII. KEE from the substrate changes the potential profile within the sheath, the sheath thickness, and current balance on MP surface. MP charge is obtained to be negative because it is caused by higher current density of secondary electrons from the substrate than that of ions. The latter is possible for KEE yield larger than a unit. The substrate biasing influences both the release of secondary electrons from the substrate under ion impact and their acceleration in the sheath. The increasing of negative substrate bias is demonstrated to result in the increasing of absolute value of negative MP charge, and, thereby, the increasing of electrostatic reflection of MP from the substrate. The negative substrate biasing is shown to be the effective alternative method to reduce MP contaminations in coatings without applying any magnetic filters.

show abstract

Effect of High-Frequency Short-Pulses Biasing on Macroparticle in Plasma Ion Implantation Systems

Romashchenko

2024

IEEE Trans. Plasma Sci.

View full text Add to dashboard Cite

Transport of a Macroparticle in Vacuum Arc Sheath

Cited by 3 publications

References 17 publications

Effect of Pulsed Substrate Biasing on Macroparticle in Vacuum Arc

Effect of Pulsed Substrate Biasing on Macroparticle in Vacuum Arc

Macroparticle Reflection from a Biased Substrtate in Plasma Ion Implantation Systems

Effect of High-Frequency Short-Pulses Biasing on Macroparticle in Plasma Ion Implantation Systems

Contact Info

Product

Resources

About