Transparent conductive nanoporous aluminium mesh prepared by electrochemical anodizing

Hubarevich, Aliaksandr; Marus, Mikita; Stsiapanau, A.; Smirnov, A.; Zhao, Jun; Fan, Wenhui; Wang, Hong; Sun, Xiao Wei

doi:10.1002/pssa.201532198

Cited by 12 publications

(5 citation statements)

References 29 publications

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“…For sulfuric acid, the diameter is 10-20 nm, and 120-140 nm for orthophosphoric acid (Fig. 3) [2,3]. In the course of the experiments, we studied the processes of formation and filling of pores with ink depending on the diameter and depth of pores.…”

Section: Experimental Partmentioning

confidence: 99%

Image Formation by Ink-Jet Printing in Micro- and Nanoporous Anodic Alumina Film with Capsulating

et al. 2018

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The image formation process based on the method of ink-jet printing in films of anodic aluminum oxide has been developed and investigated. The image resolution of 500 dpi was achieved on the films with 150 µm depth of pores. The films of anodic aluminum oxide were produced on aluminum foil by partial or through anodizing of aluminum followed by filling the pores with ink and their capsulation for protection. The obtained films have exceptional thermal and chemical stability. The low-temperature and low-cost process described in this article is promising for mass production of elements of microelectronic devices.

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Section: Experimental Partmentioning

confidence: 99%

Image Formation by Ink-Jet Printing in Micro- and Nanoporous Anodic Alumina Film with Capsulating

et al. 2018

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“…At the same time, it eliminates the need for lithography and other costly manufacturing processes and becomes more effective as the cell gets thinner. The nanostructure resembling a nanoscale Tsuchime (or hammertone) patterned surface results from the electrochemical nanoporous (NP) anodization of Al followed by etching away the NP alumina (Al 2 O 3 ) layer [23]. This method is cost-effective, lithography-free, easily scalable, and allows for the diameter and depth of resulting nanocraters (NCs) to be tuned in a wide range [23][24][25][26].…”

Section: Introductionmentioning

confidence: 99%

“…The nanostructure resembling a nanoscale Tsuchime (or hammertone) patterned surface results from the electrochemical nanoporous (NP) anodization of Al followed by etching away the NP alumina (Al 2 O 3 ) layer [23]. This method is cost-effective, lithography-free, easily scalable, and allows for the diameter and depth of resulting nanocraters (NCs) to be tuned in a wide range [23][24][25][26]. Moreover, it allows for the production of ordered micro/submicro-and nanopatterned surfaces by iterating the procedure in several steps of anodization followed by etching [27,28].…”

Section: Introductionmentioning

confidence: 99%

Tsuchime-like Aluminum Film to Enhance Absorption in Ultra-Thin Photovoltaic Cells

Marus,

Mukha,

Wong

et al. 2023

Nanomaterials

Self Cite

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Ultra-thin solar cells enable materials to be saved, reduce deposition time, and promote carrier collection from materials with short diffusion lengths. However, light absorption efficiency in ultra-thin solar panels remains a limiting factor. Most methods to increase light absorption in ultra-thin solar cells are either technically challenging or costly, given the thinness of the functional layers involved. We propose a cost-efficient and lithography-free solution to enhance light absorption in ultra-thin solar cells—a Tsuchime-like self-forming nanocrater (T-NC) aluminum (Al) film. T-NC Al film can be produced by the electrochemical anodization of Al, followed by etching the nanoporous alumina. Theoretical studies show that T-NC film can increase the average absorbance by 80.3%, depending on the active layer’s thickness. The wavelength range of increased absorption varies with the active layer thickness, with the peak of absolute absorbance increase moving from 620 nm to 950 nm as the active layer thickness increases from 500 nm to 10 µm. We have also shown that the absorbance increase is retained regardless of the active layer material. Therefore, T-NC Al film significantly boosts absorbance in ultra-thin solar cells without requiring expensive lithography, and regardless of the active layer material.

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“…Here, we propose to use a self-forming nanopatterned aluminium (Al) film to significantly increase absorption in thin and ultra-thin Si solar panels. The nanostructure, resembling a nanoscale Tsuchime (or hammertone) patterned surface, results from the electrochemical nanoporous (NP) anodizing of Al followed by etching away the NP alumina (Al 2 O 3 ) layer [22]. This method of Al NP anodizing followed by removing the oxide completely omits the use of costly equipment, such as lithography; the method easily scales, and allows tuning the diameter and depth of resulting nanocraters (NCs) in a wide range [22][23][24].…”

Section: Introductionmentioning

confidence: 99%

“…The nanostructure, resembling a nanoscale Tsuchime (or hammertone) patterned surface, results from the electrochemical nanoporous (NP) anodizing of Al followed by etching away the NP alumina (Al 2 O 3 ) layer [22]. This method of Al NP anodizing followed by removing the oxide completely omits the use of costly equipment, such as lithography; the method easily scales, and allows tuning the diameter and depth of resulting nanocraters (NCs) in a wide range [22][23][24]. Moreover, it allows producing ordered micro/submicro-and nanopatterned surfaces by iterating the procedure in several steps of anodizing followed by etching -factually making prior NC pattern a mask for the following anodization [25,26].…”

Section: Introductionmentioning

confidence: 99%

Tsuchime-like cost-efficient aluminum film to enhance absorption in thin and ultra-thin photovoltaic cells

Marus¹,

Mukha²,

Wong³

et al. 2023

Preprint

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Silicon solar cells account for more than ninety percent of the photovoltaic (PV) market, primarily due to convenience, cost-effectiveness, and long service life. However, the light absorption efficiency of PV cells remains a limiting factor, especially for thin and ultra-thin solar panels. Most methods for increasing light absorption in thin and ultra-thin solar cells are either cost-ineffective or technically challenging, given the thinness of the functional layers employed. In this article, we propose employing a lithography-free and cost-efficient approach to increase the light absorption in thin and ultra-thin solar cells using a Tsuchime-like self-forming nanocrater (T-NC) aluminum (Al) film. T-NC Al film can be obtained by the well-known process of electrochemical anodizing of Al followed by etching the nanoporous alumina (Al2O3). According to the current study, T-NC film boosts the average absorbance in the 400-1100 nm wavelength range by 85.9, 64.3, 46.3 and 41.8% for PV cells with silicon active layer thickness of 500 nm, 1 µm, 3 µm, and 10 µm, respectively. Moreover, the wavelength range of increased absorption depends on silicon thickness, where the peak of absolute increase of absorbance moves from 620 nm to 950 nm as the thickness of the silicon layer increases from 500 nm to 10 µm. Therefore, T-NC Al film allows for a significant increase in the efficiency of thin and ultra-thin solar cells without involving costly top-down techniques such as lithography.

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Transparent conductive nanoporous aluminium mesh prepared by electrochemical anodizing

Cited by 12 publications

References 29 publications

Image Formation by Ink-Jet Printing in Micro- and Nanoporous Anodic Alumina Film with Capsulating

Image Formation by Ink-Jet Printing in Micro- and Nanoporous Anodic Alumina Film with Capsulating

Tsuchime-like Aluminum Film to Enhance Absorption in Ultra-Thin Photovoltaic Cells

Tsuchime-like cost-efficient aluminum film to enhance absorption in thin and ultra-thin photovoltaic cells

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