Transmittance from visible to mid infra-red in AZO films grown by atomic layer deposition system

ITO and AZO films for low emissivity coatings in hybrid photovoltaic-thermal applications

“…So far, the intense research in this field has focused on studying the electrical performance and the transparency in the visible and near infrared (300-2000 nm), as the two most relevant properties for visual displays and solar energy applications. Existing literature covers the impact of the fabrication method and deposition conditions [7,14,[18][19][20][21][22][23], the post-processing of the film (such as high temperature annealing treatments) [15,17,[24][25][26][27][28] or the role of the substrate in governing the properties of the TCOs [29,30]. In respect to the latter, most works use glass or SiO 2 as substrates [19,23,24,[31][32][33][34] or, more recently, flexible, lightweight materials like PET or PEN [30].…”

Deposition of ZnO thin films from aqueous solution in a low power plasma reactor

“…The usual deposition techniques used to elaborate doped and undoped ZnO are Pulsed Laser Deposition (PLD) [5,6], Atomic Layer Deposition (ALD) [7,8], sol-gel [9,10], Metal Organic Chemical Vapor Deposition (MOCVD) [11,12], Sputtering [13,14] and electrodeposition [15,16]. Table 1 summarizes some working parameters which control these techniques; such as the nature of precursors, the pressure, the temperature and the power.…”

Ni/FTO bilayer thin films with high photoelectric properties optimized by magnetic-field-assisted laser annealing

“…3(b) and Table 1, respectively. All samples exhibit oscillations within the Vis-NIR region, which correspond to constructive and destructive interference between multiple bounce beams from the air/Ni, Ni/FTO and FTO/glass interfaces [14]. It is seen from the inset in Fig.…”