Transmission scanning near-field optical microscopy with uncoated silicon tips

Danzebrink, Hans‐Ulrich; Castiaux, Annick; Girard, Christian; Bouju, Xavier; Wilkening, G.

doi:10.1016/s0304-3991(97)00101-0

Cited by 16 publications

(10 citation statements)

References 20 publications

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“…For one of the two cases, they investigate the influences of light crossing efficiency with the variations of taper and radius of aperture also. Using Green's function method, the field distribution of the uncoated probe is evaluated by Girard [13]. When using these simulation methods to perform numerical operations to analyze the near-field characteristics of optical fiber probe, they usually need enormous computing time and colossal frequencies of computer memory access.…”

Section: Introductionmentioning

confidence: 99%

The near-field power density distribution characteristics for different types of optical fiber probes

Lin

Yang

2005

Int J Adv Manuf Technol

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When the mechanism of near-field photolithography is analyzed, the most important work is the near-zone field analysis of the optical fiber probe. In this paper, the electromagnetic theory for near-field radiation using the magnetic current and electric current as sources is adopted as the model of the near-field optics. By applying this theorem, the near-field distribution characteristics of the uncoated probe and metal-coated probe are explored. Furthermore, the simulations of the nearfield for different light source, such as parallel beam of light (plane wave) and Gaussian-distributed light passing through the optical fiber probe are also discussed. Based upon the model of this research, the time-average Poynting vector distribution of the radiation field, and the relationship between the power density and near-field distance for the optical fiber probe can be estimated. According to the results, when the near-field distance between the metal-coated probe and sampling is maintained at 0.3ρ 0 ≤ Z ≤ 0.6ρ 0 , the process is proved to be more adequate for the near-field photolithography. Meanwhile, from the analysis of the near-field power density distribution, it provides an evaluation of concentration of photo active compound (PAC) in the photoresist after exposure and contour after development. The relationship between the power density and near-field distance can be used as a rule of tip-sampling distance modulation when controlling the magnitude of exposure energy. This near-field photolithography engineering perplexity encountered can therefore be solved.

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Section: Introductionmentioning

confidence: 99%

The near-field power density distribution characteristics for different types of optical fiber probes

Lin

Yang

2005

Int J Adv Manuf Technol

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“…The development of near‐field optical probes based on silicon cantilevers appears very promising in the infrared spectral range, where Si becomes transparent (Castiaux et al . 1998; Danzebrink et al . 1998).…”

Section: Motivationmentioning

confidence: 99%

Nano‐slit probes for near‐field optical microscopy fabricated by focused ion beams

Danzebrink

Dziomba

Sulzbach³

et al. 1999

Journal of Microscopy

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The near-field probes described in this paper are based on metallized non-contact atomic force microscope cantilevers made of silicon. For application in high-resolution near-field optical/infrared microscopy, we use aperture probes with the aperture being fabricated by focused ion beams. This technique allows us to create apertures of sub-wavelength dimensions with different geometries. In this paper we present the use of slit-shaped apertures which show a polarization-dependent transmission efficiency and a lateral resolution of < 100 nm at a wavelength of 1064 nm. As a test sample to characterize the near-field probes we investigated gold/palladium structures, deposited on an ultrathin chromium sublayer on a silicon wafer, in constant-height mode.

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“…with far-field light collection. 6 Metal-coated tips in small-aperture-SNOM (`100 nm) become very hot (b100°C) 7 and are very blunt. Thus, the aperture cannot be operated at constant shear-force distance on rough or sensitive surfaces.…”

Section: Introductionmentioning

confidence: 99%

Artifacts in scanning near-field optical microscopy (SNOM) due to deficient tips

Kaupp

Herrmann

Haak

1999

J. Phys. Org. Chem.

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Apertureless scanning near-field optical microscopy (SNOM) in the reflection-back-to-the-fiber configuration is possible on rough surfaces of practical importance and reaches 15 nm lateral resolution. The feedback for constant distance mode is provided by shear-force atomic force microscopy. Any artifacts in the atomic force microscopy will translate into artificial optical responses. Very sharp tapered tips (radius ca. 15 nm, apex angle`10°) are required. Only these give the strongly enhanced reflectance in shear-force distance, do not break as easily as do more blunt tips, and can follow the topography in order to provide chemical SNOM contrast without topographic errors. In the absence of significant reflectance enhancement, if blunt or abrased or broken tips are used, not SNOM but artificial 'optical contrast' is recorded. Metal-coated tips are unsuitable: they become hot, give poor resolution and are the source of numerous additional artifacts that are summarized for comparison. The SNOM artifacts are subdivided into:* topographic errors-if chemical uniform topography does give some optical response; * lack of spatial correlation-if the optical signal does not reproduce the site of the emitter or of the chemical contrast; * tip imaging-very large features and more or less negative differentials therefrom; * contrast inversion-false sign of optical contrast; * split optical contrast-signal is split into two unequal parts with the same (false) sign of the contrast; * artificial stripes-instead of chemical/emissive contrast artificial stripes, that are not always 'interference fringes' or 'edge-contrast'.The artifacts can be easily recognized in published images from different techniques and modes of SNOM. Their analysis would be facilitated if full x/y/z data were published instead of two-dimensional images. We therefore disclose interactively analyzable VRML data in the EPOC version.

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Transmission scanning near-field optical microscopy with uncoated silicon tips

Cited by 16 publications

References 20 publications

The near-field power density distribution characteristics for different types of optical fiber probes

The near-field power density distribution characteristics for different types of optical fiber probes

Nano‐slit probes for near‐field optical microscopy fabricated by focused ion beams

Artifacts in scanning near-field optical microscopy (SNOM) due to deficient tips

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