2004
DOI: 10.1557/jmr.2004.0145
|View full text |Cite
|
Sign up to set email alerts
|

Transmission Electron Microscopy and High-Resolution Transmission Electron Microscopy Study of Nanostructure and Metastable Phase Evolution in Pulsed-Laser-Ablation–Deposited Ti–Si Thin Film

Abstract: Thin films with a nominal composition close to Ti62.5Si37.5 were deposited on NaCl substrate at room temperature by pulsed laser ablation to study the evolution of the intermetallic compound Ti5Si3 using a combination of high-resolution and in situ transmission electron microscopy. The as-deposited amorphous films contain Ti-rich clusters, which influence the phase evolution and the decomposition behavior of the amorphous film. These clusters influence the nucleation of a metastable fcc Ti solid solution (ao =… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

0
3
0

Year Published

2006
2006
2007
2007

Publication Types

Select...
2

Relationship

1
1

Authors

Journals

citations
Cited by 2 publications
(3 citation statements)
references
References 14 publications
0
3
0
Order By: Relevance
“…The formation of coatings and thin films using pulsed laser ablation process is increasingly gaining importance. [1][2][3][4] The rapid superheating at the subsurface due to coupling and transfer of energy from the laser beam to the target materials leads to catastrophic vaporization and explosion resulting in generation of atomized droplets in addition to the vapor plasma. The vapor plasma and the liquid droplets move at high speed (∼10-100 ms −1 ) 5 and are quenched on a suitably positioned substrate.…”
Section: Introductionmentioning
confidence: 99%
“…The formation of coatings and thin films using pulsed laser ablation process is increasingly gaining importance. [1][2][3][4] The rapid superheating at the subsurface due to coupling and transfer of energy from the laser beam to the target materials leads to catastrophic vaporization and explosion resulting in generation of atomized droplets in addition to the vapor plasma. The vapor plasma and the liquid droplets move at high speed (∼10-100 ms −1 ) 5 and are quenched on a suitably positioned substrate.…”
Section: Introductionmentioning
confidence: 99%
“…Pulsed laser ablation (PLD) is a versatile technique for depositing thin film of metals, alloys and ceramics [1][2][3][4][5][6][7][8]. The process primarily involves quenching of matter from vapour and plasma on a substrate by striking a high-power pulsed laser beam on a target [9].…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, plasma generated during this process often contains charged clusters. It has been shown recently that these clusters can modify the nature of the initial amorphous condensate and, hence, crystallization pathways [7]. Therefore, vapour quenching using laser ablation technique provides a unique opportunity to study the evolution of metastable phases and microstructures.…”
Section: Introductionmentioning
confidence: 99%