1984
DOI: 10.1111/j.1751-1097.1984.tb08858.x
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TRANSITORY UV RESISTANCE DURING GERMINATION OF UV‐SENSITIVE SPORES PRODUCED BY A MUTANT OF Bacillus cereus 569

Abstract: Abstract— A mutant of Bacillus cereus 569, isolated by us and designated 2422 is unable to excise cyclobutane‐type dimers and spore‐specific photoproducts from the DNA of UV‐irradiated vegetative cells and dormant spores. The deficiency in the excision repair mechanism was found to be at the post‐incision step in the exonuclease‐mediated removal of the photoproducts. During germination, the mutant B. cereus 2422 exhibits UV‐resistance and an efficient photoproduct removal which is followed by DNA repair synthe… Show more

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Cited by 2 publications
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“…This stage lasts only 1 to 6 min for individual spores (4). In spores of B. megaterium and B. cereus, this period of high UV resistance is correlated with a low efficiency of formation of spore photoproducts as well as of pyrimidine dimers in DNA (9,13). It was suggested that this was due to a transient change in DNA structure or environment which rendered the DNA photochemically unreactive (9).…”
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confidence: 99%
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“…This stage lasts only 1 to 6 min for individual spores (4). In spores of B. megaterium and B. cereus, this period of high UV resistance is correlated with a low efficiency of formation of spore photoproducts as well as of pyrimidine dimers in DNA (9,13). It was suggested that this was due to a transient change in DNA structure or environment which rendered the DNA photochemically unreactive (9).…”
mentioning
confidence: 99%
“…Second, spores have at least two mechanisms which efficiently repair this spore photoproduct during spore germination, including one which monomerizes the adduct back to two thymines (7,12). Surprisingly, when spores germinate they go through a transient stage of extremely high UV resistance, much higher than that of the dormant spore (3,9,13). This stage lasts only 1 to 6 min for individual spores (4).…”
mentioning
confidence: 99%