The thermal agglomeration of ultrathin silicon-on-insulator (SOI) layers with different crystalline orientations [(110)-, (100)-, and (111)-oriented SOI layers] is reported. (110) SOI agglomeration leads to the formation of Si island arrays along h221i and h332i directions, while (100) and (111) SOI agglomerations result in Si island arrays in h310i directions and Si wires in h121i directions, respectively. The {311} facets mainly determine the direction of the agglomerated shape, whereas the symmetric and asymmetric facet properties are responsible for Si island and wires formation, respectively. These results indicate that Si islands or wires can be formed in certain directions by selecting the appropriate SOI crystalline orientation.