Transient optical absorption in calcium fluoride crystals

Степанов, С. А.; Chinkov, E. P.; Shrayber, A.; Shtan’ko, V. F.

doi:10.1016/j.radphyschem.2021.109889

Cited by 2 publications

(1 citation statement)

References 38 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The good agreement demonstrated the reliability of the measured low-light-level absorption coefficient, which could be used to determine the internal transmission of the DUV-fused silica material used in the 193 nm optical lithography. The absorption measurement method presented in this paper is expected to find applications to the determination of the low internal transmission of other DUV optical materials such as CaF 2 [4,38] and to the investigations of the optical degradation of DUV optical materials [20,39].…”

Section: Discussionmentioning

confidence: 99%

Accurate Determination of the Low-Light-Level Absorption of DUV-Fused Silica at 193 nm with Laser Calorimetry

Li,

Sun,

Liu

et al. 2024

Photonics

View full text Add to dashboard Cite

The low-light-level absorption coefficient of OH-contained and H2-impregnated synthetic fused silica material in 193 nm optical lithography application is determined via a laser calorimetry measurement. The fluence and repetition rate dependences of the absorptances of the deep ultraviolet (DUV)-fused silica samples with different thickness are measured. The measured dependences are fitted to a theoretical model, taking into consideration the generation and annealing of laser irradiation induced defects. The surface absorption, the low-light-level linear absorption coefficient, as well as the nonlinear absorption coefficient of the fused silica material are accurately determined via the fitting. The low-light-level linear absorption coefficients determined via the fluence dependence and the repetition rate dependence are in good agreement, demonstrating the reliability of the measured low-light-level absorption coefficient, which is the key parameter to the determination of the internal transmission of the DUV-fused silica material used in the 193 nm optical lithography.

show abstract