2023
DOI: 10.1109/jphotov.2023.3243399
|View full text |Cite
|
Sign up to set email alerts
|

Transient Metastable Behavior Caused by Magnesium-Doped Zinc Oxide Emitters in CdSeTe/CdTe Solar Cells

Abstract: Metastable behavior in highly efficient MZO/CdSeTe/ CdTe solar cells has been reported previously. Different preconditioning procedures have been studied that are used to recover the performance of the devices. 11 wt% of MgO content in the MZO layer has shown to give optimized photovoltaic parameters in the device compared to other MZO compositions. J-V characteristics before preconditioning of the devices with higher MgO content show an "S" shaped behavior, which is removed during preconditioning. However, th… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2023
2023
2023
2023

Publication Types

Select...
1
1

Relationship

1
1

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 24 publications
(28 reference statements)
0
2
0
Order By: Relevance
“…Although it has not been possible to measure carrier concentrations of as‐deposited MZO, it has been thought that doping may occur in the MZO layer, due to the formation of oxygen vacancies during the CdCl 2 activation treatment. [ 17 ] Device modeling suggests that higher values in the n ‐type buffer layer than the p ‐type absorber is a condition for high device efficiency. [ 29 ] We have used a high‐sensitivity parallel dipole line (PDL) Hall effect system [ 30 ] to measure the carrier concentration of very thin (50 nm) and highly resistive ZnO films.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Although it has not been possible to measure carrier concentrations of as‐deposited MZO, it has been thought that doping may occur in the MZO layer, due to the formation of oxygen vacancies during the CdCl 2 activation treatment. [ 17 ] Device modeling suggests that higher values in the n ‐type buffer layer than the p ‐type absorber is a condition for high device efficiency. [ 29 ] We have used a high‐sensitivity parallel dipole line (PDL) Hall effect system [ 30 ] to measure the carrier concentration of very thin (50 nm) and highly resistive ZnO films.…”
Section: Resultsmentioning
confidence: 99%
“…[ 15 ] Although the ‘S’ shaped behavior can be removed after preconditioning with light soaking, the recovery typically only remains for about three days. [ 17 ] This instability is a severe drawback of using MZO in a device. It is vital to explore alternative materials that can replace existing buffer layers to further improve device efficiency while ensuring long‐term stability.…”
Section: Introductionmentioning
confidence: 99%