therefore to explore possibilities for the design of MOS devices and architectures that can control or adjust the Schottky barrier and then modulate its photoelectric response.Early studies in this area focused on changing the Schottky barrier height (SBH) by the adjustment of oxide layer thickness and metal coverage, as exemplified by the work of Peckerar [15] and Doniach et al. [16] in the 1970s and 1980s, where it was found that the SBH always increased with both the oxide layer thickness and the extent of metal coverage. Subsequently, with the downscaling of MOS devices to nanometer dimensions, more sophisticated methods for control of the SBH have been investigated. Such methods include atomic-level chemical modification of the semiconductor interface, [17] embedment of quantum wells in the semiconductor layer, [18] and replacement of the metal layer by an inorganic-organic hybrid to overcome Fermi-level pinning. [8] All of these methods for altering the SBH are, however, confined to the fabrication stage, after which the SBH for the MOS-structure is fixed. Some modification of the SBH of a MOS structure during operation stage has also been tried and proved to be effective through the application of either light or an electric field. However, these changes are always volatile, scilicet the Schottky barrier reverts to its initial as-fabricated state once the external field is removed. Only a few studies [19] on nonvolatile SBH control were reported in recent years. In this letter we report the observation of a tunable photoelectric effect in a nanoscale MOS structure, and demonstrate that this tunable effect is dominated by control of the SBH through combined application of laser illumination and electric pulses. The most striking feature of this controllable change of the SBH is its nonvolatility and unique trigger manner. The work may provide an opportunity for the development of novel MOS devices with a wider range of applications.