Time resolved imaging has been used to analyze structural transformations induced by intense 100 fs laser pulses in amorphous GeSb films. Above a threshold of 19 mJ͞cm 2 the data show the formation of a transient nonequilibrium state of the excited material within 300 fs. The results are consistent with an electronically induced, amorphous-to-crystalline phase transition. [S0031-9007(98) PACS numbers: 61.80. Ba, 61.43.Dq, 68.35.Bs, 68.35.Rh The existence of nonthermal, ultrafast phase transitions after strong femtosecond laser excitation has been demonstrated in several materials such as silicon [1][2][3], gallium arsenide [3-6], indium antimonide [7], and carbon [8]. It is accepted that such transitions are induced by a softening of the lattice structure due to the generation of a very high density electron-hole plasma, as first proposed by Van Vechten [9]. Most of the experimental and theoretical work [10][11][12][13] has concentrated on the solid-to-liquid phase transformation of the above mentioned materials. Some authors [2,11] have also claimed the existence of an ultrafast solid-to-solid phase transition preceding nonthermal melting, although there is experimental evidence [3,7] refusing this hypothesis.In this Letter we present a time resolved study on the dynamics of femtosecond laser induced structural transformations in amorphous GeSb. We describe experimental evidence for the subpicosecond formation of a transient phase of the material and interpret our results as first indication for an ultrafast, nonthermal amorphousto-crystalline phase transition. Sb-rich amorphous GeSb films can be crystallized upon irradiation with ultrashort laser pulses [14] and show a large optical contrast upon transformation [15]. This effect makes GeSb a promising material for the development of rewritable optical memories driven by ultrashort laser pulses [16]. Recently, it has been demonstrated [17] that the energy fluence necessary to induce crystallization in this material decreases significantly for pulses shorter than a picosecond, suggesting the relevance of electronic processes in the amorphousto-crystalline transition.Amorphous Ge 0.06 Sb 0.94 , 50-nm-thick films were grown on glass substrates at room temperature in a multitarget dc magnetron sputtering system from pure (99.999%) Ge and Sb targets. The films were irradiated with 100 fs laser pulses at 620 nm delivered by a 10-Hz amplified colliding-pulse mode-locked (rhodamine 6G͞DODCI) dye laser. The evolution of the reflectivity of the irradiated surface was monitored with both femtosecond time and micrometer spatial resolution by means of ultrafast time-resolved microscopy [18]. A first laser pulse excites the sample. A second time-delayed probe pulse replaces the standard illumination of an optical microscope and provides snapshot pictures of the excited surface with 100 fs time resolution. The optical micrographs are recorded with the help of a charged coupled device detector in conjunction with a computer controlled frame-grabber. Since a single laser pu...