The UV/monochloramine (NH2Cl) process is an emerging
advanced oxidation process (AOP) in water treatment via radicals produced
from the UV photolysis of NH2Cl. This study investigated
the degradation of micropollutants by the UV/NH2Cl AOP,
with ibuprofen (IBP) and naproxen (NPX) selected as representative
micropollutants. Hydroxyl radical (HO•) and chlorine
atom (Cl•) were identified in the process, and unexpectedly,
we found that reactive nitrogen species (RNS) also played important
roles in the transformation of micropollutants. The electron paramagnetic
resonance (EPR) analysis proved the production of •NO as well as HO•. The concentrations of HO•, Cl•, and •NO
in UV/NH2Cl remained constant at pH 6.0–8.6, resulting
in the slightly changed UV fluence-based pseudo-first-order rate constants
(k′) of IBP and NPX, which were about 1.65
× 10–3 and 2.54 × 10–3 cm2/mJ, respectively. For IBP, the relative contribution
of RNS to k′ was 27.8% at pH 7 and 50 μM
NH2Cl, which was higher than that of Cl• (6.5%) but lower than that of HO• (58.7%). For
NPX, the relative contribution of RNS to k′
was 13.6%, which was lower than both Cl• (23.2%)
and HO• (46.9%). The concentrations of HO•, Cl•, and •NO increased with
the increasing NH2Cl dosage. Water matrix components of
natural organic matter (NOM) and bicarbonate can scavenge HO•, Cl•, and RNS. The presence of 5 mg/L NOM decreased
the k′ of IBP and NPX by 66.9 and 57.6%, respectively,
while 2 mM bicarbonate decreased the k′ of
IBP by 57.4% but increased the k′ of NPX by
10.5% due to the contribution of CO3
•– to NPX degradation. Products containing nitroso-, hydroxyl-, and
chlorine-groups were detected during the degradation of IBP and NPX
by UV/NH2Cl, indicating the role of nitrogen oxide radical
(•NO) as well as HO• and Cl•. Trichloronitromethane formation was strongly enhanced
in the UV/NH2Cl-treated samples, further indicating the
important roles of RNS in this process. This study first demonstrates
the involvement of RNS in the transformation of micropollutants in
UV/NH2Cl.