1992
DOI: 10.1103/physrevb.46.12810
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Transformation of Cl bonding structures on Si(100)-(2×1)

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Cited by 42 publications
(26 citation statements)
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“…This structural model is confirmed by photoemission measurements [8], Low-Energy Electron Energy-Loss Spectroscopy (LEELS) [73] and SEXAFS measurements [74]. This binding configuration is also favoured by measurements of the Electron-Stimulated-Desorption IonAngular-Distribution (ESDIAD) [75].…”
Section: Adsorption Of Group-vil Elements: C1 On Si(o01)supporting
confidence: 50%
“…This structural model is confirmed by photoemission measurements [8], Low-Energy Electron Energy-Loss Spectroscopy (LEELS) [73] and SEXAFS measurements [74]. This binding configuration is also favoured by measurements of the Electron-Stimulated-Desorption IonAngular-Distribution (ESDIAD) [75].…”
Section: Adsorption Of Group-vil Elements: C1 On Si(o01)supporting
confidence: 50%
“…In particular, the adsorption of Cl 2 on Si(001) surfaces has been studied by a variety of experiments and theoretical calculations [2][3][4][5][6][7][8][9][10][11]. Experiments using electron stimulated desorption ion angular distribution (ESDIAD) and high resolution electron energy loss (HREELS) have demonstrated the existence of a stable adsorption site at the dangling bond and a metastable bridge-bonded state [6]. The structural properties and energetics of these two sites have been explained satisfactorily by density functional calculations [7][8].…”
Section: Introductionmentioning
confidence: 99%
“…The first ESDIAD studies on a covalent surface, Si(100), concerned the adsorption of fluorine [14]. More recently, -CI groups produced by Cl 2 chemisorption near 500 K on Si(100)-(2x1) have been investigated with ESDIAD [7,15]. A four-beam Cl+ pattern is observed at 120 K as shown in Figure 4b and 4c.…”
Section: B Chemisorption On a Semiconductor Surfacementioning
confidence: 99%
“…A four-beam Cl+ pattern is observed at 120 K as shown in Figure 4b and 4c. These CI+ beams originate from Si-Cl covalent bonds, which are inclined from the surface normal in four specific directions at an angle of 25 ± 4 from the surface normal [7]. These four directions correspond to the orthogonal Si-Si surface dimer bond directions exposed on alternate terraces of Si (100); the steps and terraces are caused by slight misalignment of the crystal, and a symmetric dimer site in one domain is shown in Figure 4a.…”
Section: B Chemisorption On a Semiconductor Surfacementioning
confidence: 99%
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