Transfer printing and nanomanipulating luminescent photonic crystal membrane nanocavities

Abstract

Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers)Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. The release of photoluminescent InGaAsP photonic crystal nanocavity chiplets from the host chip for creating autonomous functional microparticles is demonstrated. A transfer printing method using a soft polymeric material as a stamp is used to transfer cavity arrays to other substrates. Alternatively, cavities are transferred individually by a nanomanipulation technique. The chiplets can be fully deterministically positioned on both the host chip and another substrate (glass) with the nanomanipulator. The chiplets have the striking property of spontaneously orienting themselves with their plane perpendicular to the receiving surface. At each stage of the process, the condition of the cavities as dependent on their immediate surroundings is monitored from their photoluminescence spectrum. V C 2012 American Institute of Physics. [http://dx

Revisiting the sublimation printability of cellulose‐based textiles in light of ever‐increasing sustainability issues

“…When the paper is heated and held in contact with the fabric, the dye is transferred to the textile fabric in the vapour phase (Figure 1). 24–28 In order to be defined as sublimable and suitable for transfer printing, a dye should have a molecular weight between 240 and 340 mol/g. Furthermore, neither an excessive number of non‐ionic polar groups nor ionised groups should be present in the dye structure 29–31 …”

Status and Development of Transfer Printing in Textiles—A Review

“…However, if the applied pressure is appropriate, with no or a highly-reduced gap between the substrate and the transfer paper/medium, an acceptably clear pattern is attained. 66…”

“…A stamp composed of a soft polymeric material used for transfer printing to register cavity arrays (releasing photoluminescent InGaAsP photonic crystal nanocavity chiplets from the host chip for creating autonomous functional microparticles) on other substrates has also been introduced. 66…”

A printed nanobeam laser on a SiO_2/Si substrate for low-threshold continuous-wave operation

“…In this work, we demonstrate an integration of a small-footprint InGaAsP nanobeam laser on a SiO 2 /Si substrate without using any adhesive material via transfer-printing process (i.e., dry transfer-printing) [4,19,20], where direct contact with the SiO 2 /Si substrate provides efficient heat dissipation for the laser [13]. With a help of micron-sized polydimethylsiloxane (PDMS) stamp developed by soft-lithography (the ratio of curing agent to base was 0.1), the nanobeam was selectively released from its parent chip and directly printed on a foreign substrate (herein, SiO 2 /Si substrate).…”