2015
DOI: 10.1557/jmr.2014.386
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Tracking subsurface ion radiation damage with metal–oxide–semiconductor device encapsulation

Abstract: We describe measurements aimed at tracking the subsurface energy deposition of ionic radiation by encapsulating an irradiated oxide target within multiple, spatially separated metal-oxide-semiconductor (MOS) capacitors. In particular, we look at incident kinetic energy and potential energy effects in the low keV regime for alkali ions (Na 1 ) and multicharged ions (MCIs) of Ar Q1 (Q 5 1, 4, 8, and 11) incident on the as-grown layers of SiO 2 on Si. With the irradiated oxide encapsulated under Al top contacts, … Show more

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Cited by 8 publications
(5 citation statements)
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“…This can be achieved by adding multiphoton absorption channels and taking into account resonance effects in photon absorption as was done for x-ray ultraviolte (XUV) XFEL modeling [44]. Another prospective avenue to investigate is the energy deposition into a surface from collisions with highly charged ion beams [45]. Although the surface exposure time is usually well beyond the time scale of our model, the charge transfer occurs on the femtosecond time scale and therefore can be modeled using a rate equation approach.…”
Section: Discussionmentioning
confidence: 99%
“…This can be achieved by adding multiphoton absorption channels and taking into account resonance effects in photon absorption as was done for x-ray ultraviolte (XUV) XFEL modeling [44]. Another prospective avenue to investigate is the energy deposition into a surface from collisions with highly charged ion beams [45]. Although the surface exposure time is usually well beyond the time scale of our model, the charge transfer occurs on the femtosecond time scale and therefore can be modeled using a rate equation approach.…”
Section: Discussionmentioning
confidence: 99%
“…The CUEBIT setup and basic operation have been reported in detail elsewhere, 23 and some previous results with electronic devices irradiated with the CUEBIT have also been reported. 24,25 The 12 mm × 12 mm Si/SiO 2 samples were mounted on a stainless steel platen and loaded into the CUEBIT target chamber. The base pressure of the target chamber was ∼1 × 10 −8 Torr, and the pressure in the beamline was in the low 10 −9 Torr range.…”
Section: B Hci Irradiationmentioning
confidence: 99%
“…We note that this data analysis technique using 2D Gaussian fits and a correction factor has been employed to investigate V FB shifts in our previous work. 24 C. Charge state dependence Figure 6 shows the results of the analysis of the midgap to inversion stretchout data for all nine samples that were irradiated. The average difference between midgap and inversion points for the pristine sample was 0.21 V. The results in Fig.…”
Section: B Data Analysismentioning
confidence: 99%
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“…Multiply/Highly charged ions (M/HCIs) are unique in the field of ion-related physics as their charge state is significantly higher than the traditional singly-charged ions which dominate the field. This charge state, which is manifest as a non-negligible potential energy of the ions, can be used to modify the surface/subsurface structure of materials in ways that are distinct from other forms of radiation [1][2][3][4][5][6]. Beams of M/HCIs are obtained from sources such as Electron Beam Ion Source/Traps (EBIS/Ts) and Electron Cyclotron Resonance (ECR) ion sources in laboratories worldwide [7][8][9][10][11][12][13][14] and most recently at our own user facility for surface modification [15] as well as medical physics [16].…”
Section: Introductionmentioning
confidence: 99%