Towards understanding the difference of optoelectronic performance between micro- and nanoscale metallic layers

Marus, Mikita; Hubarevich, Aliaksandr; Wang, Hong; Mukha, Yauhen; Smirnov, A.; Huang, Hui; Sun, Xiao Wei; Fan, Weijun

doi:10.1364/ome.6.002655

Cited by 5 publications

(6 citation statements)

References 27 publications

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“…ber of the NW crossitigs when the NW film changes from insulator to conductor, Vc is the NW crossings volume and Vue is the unit cell volume. Above mentioned models were proved to be in good agreement with experimental data and successfully applied by our group in previous work [113][114][115][116][117][118]. the diameter of NWs strongly improves the conductivity of TCLs, it also leads to significantly higher haze and thus limits the applications of TCLs on their base [101,152].…”

Section: Synthesis Of Agnwssupporting

confidence: 70%

“…where on is the conductivity of metal, <his the volume fraction of patterned metal layer, t/lcrir is the volume fraction threshold when the conductivity of patterned metal layer is zero, his the thickness of the metal layer and tis the critical exponent. Above mentioned methods were successfully applied by our group in several research articles [113][114][115][116][117][118].…”

Section: Methodology For Comparing Np and Nw Tclsmentioning

confidence: 99%

“…We assumed ideal crossings of NWs for both uniform and random layers. Above mentioned models were successfully applied by our group in [113][114][115][116][117][118].…”

Section: Methodology For Comparing Random and Ordered Nw Tclsmentioning

confidence: 99%

“…A uniform broadband transmittance is observed for wavelengths longer than 400 nm, while decrement due to the localized surface plasmon resonance is in range of 325-400 nm. We have successfully implemented the abovementioned model in series of publications [113][114][115][116][117]. The values of NW radius rand SC were 50 run and 35%, respectively.…”

Section: Vue )Tmentioning

confidence: 99%

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Novel metallic transparent conductive layers for optoelectronics

Marus¹

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for their constant support, guidance and understanding throughout my research work. Thanks to Prof Aliaksandr Smirnov for his suggestions and help before and during my PhD track. I am grateful to Jeremy for his help and time contributed to our project. It has been my pleasure to work with you all and I hope to continue our collaboration in future. I want to thank Dr Aliaksandr Hubarevich for all his help, support, and for being my friend no matter what problems we faced during our time here. I am looking forward to stay in touch and continue to work together on future projects. Thanks to Julia Gusakova for our teatimes, funny and serious talks; you and Aliaks helped me to stay animated and in good mood. I am very grateful to Nanyang Technological University for being my home for the last four years, a place to develop my personality and skills. Special. thanks to the staff of Graduate Programme Office and especially to Christina for your care, you have always had time to listen to my (many) questions and carefully explain. Many thanks to A *STAR for making it all possible. Hard to express how grateful I am to my wife, Arina, for all her help, care, support and love. I know how hard it was for you. Thanks to my parents and my brother for staying in touch and supporting me. I dedicate this thesis to my family, my wife and our son Leon.

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Section: Synthesis Of Agnwssupporting

confidence: 70%

Section: Methodology For Comparing Np and Nw Tclsmentioning

confidence: 99%

“…We assumed ideal crossings of NWs for both uniform and random layers. Above mentioned models were successfully applied by our group in [113][114][115][116][117][118].…”

Section: Methodology For Comparing Random and Ordered Nw Tclsmentioning

confidence: 99%

Section: Vue )Tmentioning

confidence: 99%

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Novel metallic transparent conductive layers for optoelectronics

Marus¹

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“…For sulfuric acid, the diameter is 10-20 nm, and 120-140 nm for orthophosphoric acid (Fig. 3) [2,3]. In the course of the experiments, we studied the processes of formation and filling of pores with ink depending on the diameter and depth of pores.…”

Section: Experimental Partmentioning

confidence: 99%

Image Formation by Ink-Jet Printing in Micro- and Nanoporous Anodic Alumina Film with Capsulating

et al. 2018

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The image formation process based on the method of ink-jet printing in films of anodic aluminum oxide has been developed and investigated. The image resolution of 500 dpi was achieved on the films with 150 µm depth of pores. The films of anodic aluminum oxide were produced on aluminum foil by partial or through anodizing of aluminum followed by filling the pores with ink and their capsulation for protection. The obtained films have exceptional thermal and chemical stability. The low-temperature and low-cost process described in this article is promising for mass production of elements of microelectronic devices.

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Metal nano-grids for transparent conduction in solar cells

Muzzillo

2017

Solar Energy Materials and Solar Cells

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Towards understanding the difference of optoelectronic performance between micro- and nanoscale metallic layers

Cited by 5 publications

References 27 publications

Novel metallic transparent conductive layers for optoelectronics

Novel metallic transparent conductive layers for optoelectronics

Image Formation by Ink-Jet Printing in Micro- and Nanoporous Anodic Alumina Film with Capsulating

Metal nano-grids for transparent conduction in solar cells

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