Conference on Lasers and Electro-Optics 2017
DOI: 10.1364/cleo_si.2017.sm1n.3
|View full text |Cite
|
Sign up to set email alerts
|

Towards Ultra-High Q Microresonators in High-Index Contrast AlGaAs-On-Insulator

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2022
2022
2022
2022

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 11 publications
0
1
0
Order By: Relevance
“…The localized residue in the coupling gap may induce detrimental effects such as scattering loss [28], excitation of other transverse modes [75], and counterpropagating mode [76]. Though significant over-etching can remove the gap residue, it induces extra sidewall roughness [77] which may cause more scattering loss. A more practical approach would be to widen the coupling gap to reduce the lag effect, avoiding the gap residue, as shown in Fig.…”
Section: Dry Etchingmentioning
confidence: 99%
“…The localized residue in the coupling gap may induce detrimental effects such as scattering loss [28], excitation of other transverse modes [75], and counterpropagating mode [76]. Though significant over-etching can remove the gap residue, it induces extra sidewall roughness [77] which may cause more scattering loss. A more practical approach would be to widen the coupling gap to reduce the lag effect, avoiding the gap residue, as shown in Fig.…”
Section: Dry Etchingmentioning
confidence: 99%