Abstract:The paper proposes a method to mitigate the ever tighter requirements for mask CD uniformity. The basic idea is simple. As the mask error enhancement factor (MEEF) soars at low ki values with pitches getting smaller it should be possible to alleviate the problem given there is a way to increase the pitch. For highly repetitive layouts like cell fields of DRAMs the solution is rather straightforward. One has to find the next larger pitch in the layout and divide the layout into sublayers. Those sub-layers are w… Show more
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