Towards scalable fabrication of ultrasmooth and porous thin carbon films

Peng, Yucheng; Burtovyy, Ruslan; Yang, Ying; Urban, Marek W.; Kennedy, Marian S.; Kornev, Konstantin G.; Bordia, Rajendra K.; Luzinov, Igor

doi:10.1016/j.carbon.2015.09.060

Cited by 12 publications

(14 citation statements)

References 46 publications

(38 reference statements)

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“…Polyacrylonitrile (PAN) has wide applications in fibers for textiles and oxidant flame‐retardant fibers due to its excellent mechanical property, thermal stability, and processability . It is also one of the major precursors for carbon materials because of its relatively high carbon yield and formability . Possessing high mechanical strength, excellent electrical conductivity and stability, the PAN‐based carbon materials (fibers and films) were used in various fields such as advanced composites, electromagnetic shielding, electronics, and structural sectors .…”

Section: Introductionmentioning

confidence: 99%

“…It is also one of the major precursors for carbon materials because of its relatively high carbon yield and formability . Possessing high mechanical strength, excellent electrical conductivity and stability, the PAN‐based carbon materials (fibers and films) were used in various fields such as advanced composites, electromagnetic shielding, electronics, and structural sectors . The properties of carbon materials mainly depend on the carbon structure in the products .…”

Section: Introductionmentioning

confidence: 99%

“…Possessing high mechanical strength, excellent electrical conductivity and stability, the PAN‐based carbon materials (fibers and films) were used in various fields such as advanced composites, electromagnetic shielding, electronics, and structural sectors . The properties of carbon materials mainly depend on the carbon structure in the products . PAN usually needs a series of heat treatments including oxidative stabilization, carbonization, and graphitization to transform into PAN‐based carbon materials .…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Structure evolution mechanism of polyacrylonitrile films incorporated with graphene oxide during oxidative stabilization

Chen

et al. 2019

J of Applied Polymer Sci

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Oxidative stabilization is a key process for polyacrylonitrile (PAN)-based carbon materials. During this process, oxygen has a significant influence on the formation of cyclization structure and crosslinking structure of PAN matrix. Here, graphene oxide (GO) was used as filler in PAN matrix, the structure evolution of GO/PAN composite was studied during oxidative stabilization. Solubility measurement revealed that the crosslinking degree increased, while the cyclization degree of stabilized films decreased after GO incorporation. The effect of GO on the structure of PAN film was characterized by XRD, DSC, DMA, FTIR, and XPS. These results verified that GO could initiate the cyclization reaction of PAN at a lower temperature. The carboxylic groups on GO sheets might take part in the cyclization reactions during the heat treatment. Moreover, the oxygen-containing molecules released from GO decomposition during the heat treatment were beneficial to the formation of crosslinking structure. The possible mechanism of the structure evaluation was proposed in this article.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Structure evolution mechanism of polyacrylonitrile films incorporated with graphene oxide during oxidative stabilization

Chen

et al. 2019

J of Applied Polymer Sci

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“…Porous carbon can be produced by various means. The techniques using high-temperature treatment of an organic precursor [17,18] are not suitable for every substrate, though. Bouts et al [19] presented a concept based on the removal of copper from a copper-containing DLC film.…”

Section: Introductionmentioning

confidence: 99%

Surface Structuring of Diamond-Like Carbon Films by Chemical Etching of Zinc Inclusions

et al. 2019

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A diamond-like carbon (DLC) film with a nanostructured surface can be produced in a two-step process. At first, a metal-containing DLC film is deposited. Here, the combination of plasma source ion implantation using a hydrocarbon gas and magnetron sputtering of a zinc target was used. Next, the metal particles within the surface are dissolved by an etchant (HNO3:H2O solution in this case). Since Zn particles in the surface of Zn-DLC films have a diameter of 100–200 nm, the resulting surface structures possess the same dimensions, thus covering a range that is accessible neither by mask deposition techniques nor by etching of other metal-containing DLC films, such as Cu-DLC. The surface morphology of the etched Zn-DLC films depends on the initial metal content of the film. With a low zinc concentration of about 10 at.%, separate holes are produced within the surface. Higher zinc concentrations (40 at.% or above) lead to a surface with an intrinsic roughness.

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“…The average film thickness was found to be 89. Peng et al [319] reported the use of 1,1,1,3,3,3-hexafluoro-2-propanol (HFIP) as solvent to prepare PAN polymer thin films with nano-scale roughness and controllable thickness by the dip coating process. HFIP is a highly volatile solvent with very low boiling point (59 °C), which is capable of dissolving PAN homopolymer as well as St-AN copolymers with high AN compositions.…”

Section: Preparation Of Thin Films Of St-an Copolymersmentioning

confidence: 99%

Understanding and controlling the structure of thin polymer films used in photolithography

Alam¹

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Line edge roughness (LER) is one of the major impediments to the semiconductor industry achieving the desired device performance and satisfying the goals set by International Technology Roadmap for Semiconductor (ITRS). LER is defined as any sort of unwanted roughness in semiconductor features, and among many other factors, structural heterogeneity of the photoresist materials is one of the sources of LER in photolithographic devices. This gives the motivation to study a new class of copolymer named 'gradient copolymer', which is unique in terms of the copolymer chain structure. The copolymer composition of gradient copolymers changes from one end of the chain to the other gradually, while the copolymer composition is on average constant along the chains for conventional statistical copolymers. In contrast, block copolymers show an abrupt switch in the polymer composition. In this study, statistical, block and gradient copolymers have been synthesized for two different monomer pairs (styreneacrylonitrile and hydroxystyrene t-butyl acrylate) using reversible addition-fragmentation chain transfer (RAFT) and conventional radical polymerization (CvRP) method, and their surface properties extensively studied.The kinetics of copolymerization of styrene (St) and acrylonitrile (AN) by RAFT method was studied in detail. Reactivity ratios of St and AN were determined for nine different feed compositions for RAFT, and the effect of solvent on reactivity ratios was discussed based on the bootstrap model. Batch polymerization of styrene (St) and acrylonitrile (AN) yielded statistical and spontaneous gradient copolymers depending on the monomer feed ratio, and the chain structures were confirmed from the change in the copolymer composition. St-and AN-centered triad distributions were determined using quantitative 13 C NMR. Using the continuous feeding approach, forced gradient St-AN copolymers were prepared, and St-block-AN copolymers synthesized by the chain extension method. Statistical, gradient and block copolymers have also been synthesized for the acetoxystyrenet-butyl acrylate monomer system. The statistical and gradient structures were confirmed from the change in the composition since this pair does not provide any well resolved peaks for different triad sequences in 13 C NMR. Hydroxystyrenet-butyl acrylate (HOST-tBA) copolymers were prepared by selective hydrolysis of 4-acetoxystyrenet-butyl acrylate (AOST-tBA) copolymers.The properties of the both copolymer systems were found to be strongly dependent on the copolymer structure. A unique broad glass transition was observed for the gradient copolymers, which is different from behaviour of the statistical and block copolymers. Surface properties of St-AN statistical, gradient and block copolymer thin films were found to be very different due to the

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Towards scalable fabrication of ultrasmooth and porous thin carbon films

Cited by 12 publications

References 46 publications

Structure evolution mechanism of polyacrylonitrile films incorporated with graphene oxide during oxidative stabilization

Structure evolution mechanism of polyacrylonitrile films incorporated with graphene oxide during oxidative stabilization

Surface Structuring of Diamond-Like Carbon Films by Chemical Etching of Zinc Inclusions

Understanding and controlling the structure of thin polymer films used in photolithography

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