Towards high-resolution scanning magnetoresistance microscopy

Costa, Margaret; Tarequzzaman, M.; Ferreira, Ricardo; Cardoso, S.; Gaspar, J.; Freitas, P. P.

doi:10.1109/nems.2017.8016977

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2020

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“…Nanometer tips, as core components of scanning probe microscopy (SPM) probes, field emission tips, microneedle arrays, etc., are widely used in material surface analysis, bio-engineering, high density data storage and micro-processing [ 1 , 2 , 3 , 4 , 5 , 6 , 7 , 8 , 9 , 10 , 11 , 12 , 13 ]. The height, aspect ratio, and radius of the tip are critical parameters which have a significant impact on the tip performance.…”

Section: Introductionmentioning

confidence: 99%

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching

et al. 2020

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This work reports a batch fabrication process for silicon nanometer tip based on isotropic inductively coupled plasma (ICP) etching technology. The silicon tips with nanometer apex and small surface roughness are produced at wafer-level with good etching homogeneity and repeatability. An ICP etching routine is developed to make silicon tips with apex radius less than 5 nm, aspect ratio greater than 5 at a tip height of 200 nm, and tip height more than 10 μm, and high fabrication yield is achieved by mask compensation and precisely controlling lateral etch depth, which is significant for large-scale manufacturing.

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