2009
DOI: 10.1016/j.physe.2008.08.016
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Towards an enhanced coupling between the Er ions and Si nanoclusters

Abstract: International audienceThe reactive magnetron co-sputtering of two confocal SiO 2 and Er 2 O 3 cathodes in argon–hydrogen plasma was used to deposit Er-doped Si-rich-SiO 2 layers. The effects of deposition conditions (such as hydrogen rate and substrate temperature) and annealing treatment (temperature and time) on the structural, compositional and photoluminescence (PL) properties of the layers were examined. An enhancement was observed of both Er 3+ PL emission and Er 3+ lifetime at 1.54 mm in comparison with… Show more

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Cited by 6 publications
(7 citation statements)
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“…Sample A was grown at 500°C under argon pressure by the cosputtering of three targets ͑SiO 2 , Er 2 O 3 , and Si͒, 15 while sample B was deposited at 100°C under argon-hydrogen mixture by the cosputtering of pure SiO 2 and Er 2 O 3 targets. 16 These samples are the result of an optimization process until achieving maximum PL signal and total lifetime under 476 nm excitation, which is not resonant with an Er 3+ direct transition. The compositions of the samples were measured x-ray photoelectron spectroscopy and secondary ions mass spectroscopy: 8.5 at.…”
Section: Methodsmentioning
confidence: 99%
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“…Sample A was grown at 500°C under argon pressure by the cosputtering of three targets ͑SiO 2 , Er 2 O 3 , and Si͒, 15 while sample B was deposited at 100°C under argon-hydrogen mixture by the cosputtering of pure SiO 2 and Er 2 O 3 targets. 16 These samples are the result of an optimization process until achieving maximum PL signal and total lifetime under 476 nm excitation, which is not resonant with an Er 3+ direct transition. The compositions of the samples were measured x-ray photoelectron spectroscopy and secondary ions mass spectroscopy: 8.5 at.…”
Section: Methodsmentioning
confidence: 99%
“…% of Si excess and 3.4ϫ 10 20 Er/ cm −3 for sample B. 16 Both layers were annealed at 910°C during 60 min in pure nitrogen flow and have a refractive index of about 1.51 at 1.55 m, while the thicknesses were 1.36 and 1.22 m for samples A and B, respectively. In particular, in sample B it was determined an absolute Er 3+ concentration efficiently coupled to the Si-nc of 3.6ϫ 10 19 cm −3 , i.e., 11% of the total Er content.…”
Section: Methodsmentioning
confidence: 99%
“…This difference is not related to a change in the absorption cross-section (as we are using the same pump conditions), but to the Er 3þ ions presence. 13,14 As already mentioned previously, Er 3þ ions are introduced in our samples during the deposition phase, 19 minimizing, therefore, the occurrence of erbium related defect states. 23 Hence, we associate the difference in emission dynamics (exciton population) with the energy transfer mechanism present in erbium co-doped sample.…”
mentioning
confidence: 80%
“…Detailed description of fabrication details can be found in Ref. 19. The sample details are summarized in Table I.…”
Section: Methodsmentioning
confidence: 99%
“…confocal pure SiO 2 and Er 2 O 3 targets. 19 To form nanoparticles, a substochiometric silicon rich silicon oxide ͑SRSO͒ is deposited followed by an annealing treatment to ensure phase separation between silicon and its oxide. In order to perform comparative spectroscopic characterization, the deposition parameters 20 employed to obtain the best sample in terms of photoluminescence ͑PL͒ intensity ͑under nonresonant pumping-476 nm͒ and lifetime of the 4 I 13/2 → 4 I 15/2 Er 3+ transition, have been used to fabricate a set of different samples with and without Er 3+ and with different annealing treatments, ͑Table I͒.…”
Section: Methodsmentioning
confidence: 99%