“…[ 51,52,53]. In atom trap experiments, the niobium (Nb) [ 14,15,19,27,54,55], magnesium diboride (MgB 2 ) [ 25,26], and high-temperature YBCO [ 28,29,56] films have been employed.The critical temperature of Nb films is about 9.5 K; usually, their thickness is within the range 400÷900 nm and the chip operation temperature is 4-6 K [ 14, 15, 19, 27, 54, 55]. Under such conditions the critical sheet current density c J of Nb films is in the range (1.6÷3.6)10 4 A/m.…”