An echelle diffraction grating based high-resolution spectrometer-on-chip on silicon oxynitride (SiON) waveguide platform operated at a wavelength range of 850 nm is demonstrated. The chip comprises 120 output waveguides with 0.25-nm wavelength channel spacing and has a size of only 11 × 6 (mm). The experimental results show that the insertion loss is -14 dB, the measured adjacent channel crosstalk is less than -25 dB, the 3 dB channel bandwidth is < 0.1 nm, and the channel non-uniformity is 3 dB for 56 channels with a wavelength ranging from 838 to 852 nm.OCIS codes: 250.3140, 230.3120. doi: 10.3788/COL201311.032501.With the advancement of the wavelength-division multiplexing systems in optical communication in the past two decades, two types of planar waveguide based grating devices have been developed, namely, arrayed waveguide grating (AWG) and echelle diffraction grating (EDG). Recently, the application of AWG and EDG in the sensing area has received substantial interest because of their powerful ability in high-resolution spectral analysis with compact size, and potential for on-chip multi-functional integration [1,2] . High index contrast silicon-on-insulator platform has been chosen for planar waveguide devices working above 1 100 nm [3,4] , which is the absorption edge of silicon, whereas the silicon oxynitride (SiON) waveguide platform for wavelength range below 1 100 nm is favorable because of its variable refractive index (from 1.47 to 2.3) and broad highly transparent wavelength range (210 nm to 2 000 nm) [5] . SiON waveguide based AWG spectrometers have been recently reported, especially for Raman spectroscopy [6] and optical coherence tomography [7,8] . Compared with AWG, EDG is significantly smaller because a folded beam path is used. The current study presents a SiON waveguide based EDG spectrometer-on-chip operating in a wavelength range of 850 nm. Figure 1 shows the schematic of our EDG device. Through the input waveguide, light arrives at the boundary of the slab waveguide, diverges into the slab waveguide, illuminates the echelle grating facets, diffracts back, and then converges to the designated output waveguide according to its wavelength.The channel waveguide (1.25 µm wide and 1 µm high) was chosen as the core waveguide structure for the input and output waveguides. Single-mode operation around 850 nm is achieved with the refractive index of 1.52 for the SiON core layer and 1.46 for the SiO 2 buffer and upper cladding layers. The adjacent output waveguides are separated by a gap of 2.75 µm to minimize crosstalk. This gap corresponds to an output waveguide spacing of 4 µm, which is spread out to 32 µm via curved waveguides. Considering the wavelength channel spacing of 0.25 nm, a linear dispersion coefficient of 16 000 is obtained. The total number of output waveguides is 120, and the EDG was designed with a free spectral range of 28 nm at the 30th diffraction order. The number of grating teeth is 600, which is large enough to cover more than 99% of light energy emitted from the input w...