2007
DOI: 10.1021/jp074462b
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Toward a Thermally Robust Operando Surface-Enhanced Raman Spectroscopy Substrate

Abstract: The work presented here describes the first steps toward designing a thermally robust surface-enhanced Raman spectroscopy (SERS) substrate with the potential to conduct in situ monitoring of catalytic reactions. Nanosphere lithography (NSL) fabricated SERS substrates were coated with thin (0.2-1.0 nm) films of atomic layer deposited (ALD) Al 2 O 3 . The thermal stability of these substrates was examined at various temperatures (100-500 °C) and over time (up to 6 h) in nitrogen. The results showed that ALD Al 2… Show more

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Cited by 92 publications
(117 citation statements)
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“…Various methods for the preparation of SERS substrates have been reported, such as atomic layer deposition (ALD) [15], chemical reduction [16], lithography [17] and ion-beam-sputtered technique [18]. However, more work is still needed to simplify the synthesis method and to improve the sensitivity.…”
Section: Introductionmentioning
confidence: 99%
“…Various methods for the preparation of SERS substrates have been reported, such as atomic layer deposition (ALD) [15], chemical reduction [16], lithography [17] and ion-beam-sputtered technique [18]. However, more work is still needed to simplify the synthesis method and to improve the sensitivity.…”
Section: Introductionmentioning
confidence: 99%
“…Consequently, the ALD technique can simultaneously control the surface layer composition, the distance from the silver to the surface and the dielectric constant of the medium surrounding the SERS substrate. [27 -30] As an example, Whitney et al [31] recently reported the improved thermal stability of lithographic silver substrates using ALD, though no SERS measurements were acquired.…”
Section: Introductionmentioning
confidence: 99%
“…(c) UV–vis absorption spectra of gold nanoparticles at elevated temperatures indicate that their LSPR shifts above temperatures of 100 °C. 94 (d) UV–vis absorption spectra of gold nanoparticles coated with 1 nm alumina at elevated temperatures indicate that stability is maintained up to 400 °C. 94 Adapted from ref (94).…”
mentioning
confidence: 99%