“…For the quasi-elastic case this very simple estimate is seen to coincide quantitatively with the difference between the IMFP and the attenuation length. 54,114 The result [Eqn (67)] also clarifies matters in the dispute concerning the escape depth of Auger electrons in the slowing down regime: 3,106,107 neither the IMFP nor the linear range determines the length scale in this case, rather the transport mean free path corrected with a function depending on the scattering parameter is the appropriate quantity to which the escape depth in the SD regime scales.…”
Section: Analytical Results Obtained In the Transport Approximationmentioning
confidence: 84%
“…This assumption exactly matches the quasi-elastic or constant cross-section approximation. For a technique where all electrons leaving the target irrespective of their energy contribute to the signal, the appropriate absorption length is obviously given by the linear range R. This is exactly the case in the so-called total electron yield (TEY) technique, 3 where the difference in the total electron yield for incident photons with energies just above and below an absorption edge is taken as a measure for the concentration of a given species. Likewise, for most applications of electron microscopy, those electrons that have lost a considerable fraction of their original energy remain of interest because they still contribute to the signal generation process.…”
Section: Transport Of Medium-energy Electrons In Solids Definitions Omentioning
confidence: 99%
“…A technique for which the slowing down surface sensitivity is of paramount importance is the so-called total electron yield (TEY) technique. 3,106,107 Until recently, the question of which parameter determines the surface sensitivity had been unresolved. Some authors claimed that it is the linear range, 106 whereas others use the IMFP.…”
Section: The Slowing Down Regimementioning
confidence: 99%
“…The same holds true for the normalized distribution of energy losses in a surface excitation. 3,16,188 (3) Absolute values of the surface excitation parameter have also been obtained in this way. It was shown that these follow the simple expression by Oswald 178 when rescaled by a material parameter.…”
Section: Impact On Quantitative Surface Analysis By Aes and Xpsmentioning
confidence: 99%
“…This survey is not restricted to AES and XPS but also includes examples for techniques such as electron microprobe analysis (EPMA) 2 and total electron yield (TEY). 3 …”
The influence of electron transport on the signal generation process in electron beam techniques is reviewed. A survey of the fundamental physical quantities for the electron-solid interaction is presented and sources for these quantities in the literature as well as semi-empirical formulae are given. The theoretical approaches used to describe multiple scattering in solids are outlined. These include the partial intensity approach and the continuous slowing down approximation to describe multiple energy losses and the transport approximation to tackle multiple deflections. A detailed description of the Monte Carlo technique is presented because this constitutes an effective means to study transport processes. The different theoretical approaches are illustrated in a survey of applications. These include: quantitative description of the surface sensitivity in Auger and photoelectron spectroscopy; line shape analysis of electron spectra; extracting information on the compositional depth profile from the combined energy/angular distribution in an electron spectrum; quasi-elastic electron reflection; inelastic electron backscattering; depth distribution of production of x-rays caused by electron bombardment; and the surface sensitivity in total electron yield electron spectroscopy. These applications demonstrate that the outlined approaches have a broad field of application, not only for electrons with energies ranging from thermal to the relativistic energy range, but also for other microbeam analysis techniques.
“…For the quasi-elastic case this very simple estimate is seen to coincide quantitatively with the difference between the IMFP and the attenuation length. 54,114 The result [Eqn (67)] also clarifies matters in the dispute concerning the escape depth of Auger electrons in the slowing down regime: 3,106,107 neither the IMFP nor the linear range determines the length scale in this case, rather the transport mean free path corrected with a function depending on the scattering parameter is the appropriate quantity to which the escape depth in the SD regime scales.…”
Section: Analytical Results Obtained In the Transport Approximationmentioning
confidence: 84%
“…This assumption exactly matches the quasi-elastic or constant cross-section approximation. For a technique where all electrons leaving the target irrespective of their energy contribute to the signal, the appropriate absorption length is obviously given by the linear range R. This is exactly the case in the so-called total electron yield (TEY) technique, 3 where the difference in the total electron yield for incident photons with energies just above and below an absorption edge is taken as a measure for the concentration of a given species. Likewise, for most applications of electron microscopy, those electrons that have lost a considerable fraction of their original energy remain of interest because they still contribute to the signal generation process.…”
Section: Transport Of Medium-energy Electrons In Solids Definitions Omentioning
confidence: 99%
“…A technique for which the slowing down surface sensitivity is of paramount importance is the so-called total electron yield (TEY) technique. 3,106,107 Until recently, the question of which parameter determines the surface sensitivity had been unresolved. Some authors claimed that it is the linear range, 106 whereas others use the IMFP.…”
Section: The Slowing Down Regimementioning
confidence: 99%
“…The same holds true for the normalized distribution of energy losses in a surface excitation. 3,16,188 (3) Absolute values of the surface excitation parameter have also been obtained in this way. It was shown that these follow the simple expression by Oswald 178 when rescaled by a material parameter.…”
Section: Impact On Quantitative Surface Analysis By Aes and Xpsmentioning
confidence: 99%
“…This survey is not restricted to AES and XPS but also includes examples for techniques such as electron microprobe analysis (EPMA) 2 and total electron yield (TEY). 3 …”
The influence of electron transport on the signal generation process in electron beam techniques is reviewed. A survey of the fundamental physical quantities for the electron-solid interaction is presented and sources for these quantities in the literature as well as semi-empirical formulae are given. The theoretical approaches used to describe multiple scattering in solids are outlined. These include the partial intensity approach and the continuous slowing down approximation to describe multiple energy losses and the transport approximation to tackle multiple deflections. A detailed description of the Monte Carlo technique is presented because this constitutes an effective means to study transport processes. The different theoretical approaches are illustrated in a survey of applications. These include: quantitative description of the surface sensitivity in Auger and photoelectron spectroscopy; line shape analysis of electron spectra; extracting information on the compositional depth profile from the combined energy/angular distribution in an electron spectrum; quasi-elastic electron reflection; inelastic electron backscattering; depth distribution of production of x-rays caused by electron bombardment; and the surface sensitivity in total electron yield electron spectroscopy. These applications demonstrate that the outlined approaches have a broad field of application, not only for electrons with energies ranging from thermal to the relativistic energy range, but also for other microbeam analysis techniques.
Abstract. TEY (total electron yield) is frequently used to investigate EXAFS and XANES in the region of low photon energies and high photoabsorption coefficients. We extended the application to quantitative surface analysis [-1,2]. For this purpose we developed by analogy to the theoretical approaches of quantitative X-ray fluorescence analysis a correlation between measured TEY-jumps at specific absorption edges of the specimen and the unknown composition. The present paper describes the derivation of the equations for primary and secondary excited contributions to the measured TEYjumps. We have checked our theory for the example of binary Au-Pd alloys. Besides, the influence of a retarding field between the specimen surface and the electron detector on the analytical results is outlined.
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