2000
DOI: 10.1039/b001796p
|View full text |Cite
|
Sign up to set email alerts
|

Total dose measurement for ion implantation using laser ablation ICP-MS

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
5
0

Year Published

2001
2001
2012
2012

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 10 publications
(5 citation statements)
references
References 3 publications
0
5
0
Order By: Relevance
“…In fact, LA in combination with inductively coupled plasma mass spectrometry (ICP-MS) gives rapid access to quantitative depth profiling. [11][12][13] The analytical characterization capability of implanted Si is a relevant issue for many material science applications. Some non-destructive techniques, e.g., X-ray fluorescence (XRF), lack the ability to perform direct depth profiling and are more or less blind to typically implanted doses, which are at the ultra-trace level.…”
Section: Introductionmentioning
confidence: 99%
“…In fact, LA in combination with inductively coupled plasma mass spectrometry (ICP-MS) gives rapid access to quantitative depth profiling. [11][12][13] The analytical characterization capability of implanted Si is a relevant issue for many material science applications. Some non-destructive techniques, e.g., X-ray fluorescence (XRF), lack the ability to perform direct depth profiling and are more or less blind to typically implanted doses, which are at the ultra-trace level.…”
Section: Introductionmentioning
confidence: 99%
“…Li et al reported LA-ICP-MS for quantitative analysis of the dopant dose implanted in crystalline silicon wafers [160]. The penetration depths and vertical profiles of four commonly used dopant ions in the semiconductor industry, B, As, Sb, and P, were studied.…”
Section: Film Doping and Depth Profilingmentioning
confidence: 99%
“…LA holds the promise of becoming the standard technique for direct solid sampling. Analytical applications of LA now cover a great range of academic and industrial fields, including geology, environmental science, forensics, semiconductor manufacturing, and archaeology (2)(3)(4)(5)(6)(7)(8)(9).…”
Section: Richard E Russo •Xianglei Mao •Samuel S Maomentioning
confidence: 99%