Effects of lanthanum (La) loading on the structural,
optical, and electrical properties of tin monoxide (SnO) films were
examined as a p-type semiconducting layer. La loading up to 1.9 atom
% caused the texturing of the tetragonal SnO phase with a preferential
orientation of (101), which was accompanied by the smoother surface
morphology. Simultaneously, the incorporated La cation suppressed
the formation of n-type SnO2 in the La-doped SnO film and
widened its optical band gap. These variations allowed the 1.9 atom
% La-loaded SnO film to have a high hole mobility and carrier density,
compared with the La-free control SnO film. The superior semiconducting
property was reflected in the p-type thin-film transistor (TFT). The
control SnO TFTs exhibited the field-effect mobility (μSAT) and I
ON/OFF ratio of 0.29
cm2 V–1 s–1 and 5.4
× 102, respectively. Enhancement in the μSAT value and I
ON/OFF ratio was
observed for the TFTs with the 1.9 atom % La-loaded SnO channel layer:
they were improved to 1.2 cm2 V–1 s–1 and 7.3 × 103, respectively. The
reason for this superior performance was discussed on the basis of
smoother morphology, suppression of disproportionation conversion
from Sn2+ to Sn + Sn4+, and reduced gap-state
density.