Titanium nitride local interconnect technology for VLSI

Tang, Tony; Wei, C.C.; Haken, R.A.; Holloway, T.C.; Hite, L.R.; Blake, T.G.W.

doi:10.1109/t-ed.1987.22980

Cited by 45 publications

(9 citation statements)

References 5 publications

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“…97,98 Consequently, TiN has been one of the most frequently used transition metal nitrides which has resulted in a good understanding of the deposition techniques, including CMOS compatible processes. 99,100 The optical properties of transition metal nitrides strongly depend on the deposition conditions and can be optimized to nearly match the optical properties of Au. 84,101,102 Fig.…”

Section: Resultsmentioning

confidence: 99%

Plasmonics on the slope of enlightenment: the role of transition metal nitrides

et al. 2015

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The key problem currently faced by plasmonics is related to material limitations. After almost two decades of extreme excitement and research largely based on the use of noble metals, scientists have come to a consensus on the importance of exploring alternative plasmonic materials to address application-specific challenges to enable the development of new functional devices. Such a change in motivation will undoubtedly lead to significant advancements in plasmonics technology transfer and could have a revolutionary impact on nanophotonic technologies in general. Here, we report on one of the approaches that, together with other new material platforms, mark an insightful technology-driven era for plasmonics. Our study focuses on transition metal nitrides as refractory plasmonic materials that exhibit appealing optical properties in the visible and near infrared regions, along with high temperature durability. We take heat-assisted magnetic recording as a case study for plasmonic technology and show that a titanium nitride antenna satisfies the requirements for an optically efficient, durable near field transducer paving the way to the next-generation data recording systems.

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Section: Resultsmentioning

confidence: 99%

Plasmonics on the slope of enlightenment: the role of transition metal nitrides

et al. 2015

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“…Metallic behavior of TiN combined with its hardness and chemical stability has attracted attention in microelectronics research [5]. Adjustable optical properties and stoichiometry of TiN thin films were examined in the 1990s [6].…”

Section: Introductionmentioning

confidence: 99%

“…Heat assisted magnetic recording [21], solar/thermophotovoltaics [22], plasmon enhanced photocatalysis [23][24][25], and plasmon assisted chemical vapor deposition [26] are some of the applications that could take advantage of durable plasmonic TiN nanostructures. TiN is a chemically inert material widely used in CMOS and biomedical devices [5,[27][28][29][30]. Combined with the localized surface plasmon resonance (LSPR) peak located in the biological transparency window [17], bio-compatibility of the material makes it a promising alternative for plasmonic photothermal therapy [18].…”

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confidence: 99%

Colloidal Plasmonic Titanium Nitride Nanoparticles: Properties and Applications

et al. 2015

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Optical properties of colloidal plasmonic titanium nitride nanoparticles are examined with an eye on their photothermal and photocatalytic applications via transmission electron microscopy and optical transmittance measurements. Single crystal titanium nitride cubic nanoparticles with an average size of 50 nm, which was found to be the optimum size for cellular uptake with gold nanoparticles [1], exhibit plasmon resonance in the biological transparency window and demonstrate a high absorption efficiency. A self-passivating native oxide at the surface of the nanoparticles provides an additional degree of freedom for surface functionalization. The titanium oxide shell surrounding the plasmonic core can create new opportunities for photocatalytic applications. an excitement to develop technologies for a broad range of applications. The wide range of carrier concentrations available from several material classes spans the electromagnetic spectrum from the ultra-violet through the midinfrared [2]. Additionally, the broad variety of materials studied in the field provide extra degrees of freedom to solve technological challenges thanks to the unique properties such as tunability, process compatibility, chemical stability, etc [3]. KeywordsTransition metal nitrides, especially titanium nitride (TiN), have been studied for the last three decades due to the unique combination of their material properties [4]. Metallic behavior of TiN combined with its hardness and chemical stability has attracted attention in microelectronics research [5]. Adjustable optical properties and stoichiometry of TiN thin films were examined in the 1990s [6]. The optical characterization of TiN thin films was extensively performed later with the increasing interest in the field of plasmonics [7][8][9][10]. Improved properties with epitaxial TiN thin films have recently been demonstrated with a hyperbolic metamaterial and a plasmonic waveguide [11,12]. As a refractory plasmonic material, TiN holds the potential to solve critical issues associated with the softness and low melting points of plasmonic metals such as gold and silver [13,14]. In contrast to thin films, TiN nanoparticles have not been extensively studied until recently. Localized surface plasmons (LSPs) in TiN nanoparticles were first theoretically analyzed by Quinten [15], while their first experimental demonstration was performed by Reinholdt et al. [16] In their work, cubic nanoparticles smaller than 10 nm with a broad size dispersion were fabricated through laser ablation, and plasmon resonance peaks centered around 730 nm wavelength were reported. Reinholdt et al. proposed the use of TiN nanoparticles as inorganic, stable color pigments. We have previously shown that TiN nanoparticles provide field enhancement comparable to that achievable with Au, with a broader peak spectrally positioned in the biological transparency window [17]. In a more recent study, we experimentally analyzed the absorption efficiencies of lithographically fabricated TiN and Au nanoparticles an...

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“…TiN until now is been widely used in semiconductor industry as a barrier metal for submicron metallization [4,5] and for local interconnect contact material in VLSI [6] technology for building CMOS devices due to its excellent thermal stability [4,5] and reduction in parasitic capacitance by the use of minimum geometry junctions [6] thus improving the overall circuit performance. In our case TiN serves as an dual advantage by exploiting its properties for MEA material as well as interconnect for the BiCMOS devices such as a npn transistor, resistor etc.…”

Section: Bicmos Devices and Its Fabricationmentioning

confidence: 99%

Titanium nitride (TiN) as a gate material in BiCMOS devices for biomedical implants

et al. 2013

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Titanium nitride (TiN) is a proven bio-compatible conductor and as such increasingly applied as an microelectrode material in novel biomedical devices. This paper reports the functioning of BiCMOS devices with titanium nitride as a gate electrode and interconnect material all fabricated in five photolithographic steps. This simple BiCMOS process allows the on-chip integration of a biomedical electrode arrays with electronics to reduce the electrode wiring density and hence reduce the electrodes footprint. This approach can be useful for medical devices like cochlear implants (CI's) where a high density electrode array is applied in a small volume.

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Titanium nitride local interconnect technology for VLSI

Cited by 45 publications

References 5 publications

Plasmonics on the slope of enlightenment: the role of transition metal nitrides

Plasmonics on the slope of enlightenment: the role of transition metal nitrides

Colloidal Plasmonic Titanium Nitride Nanoparticles: Properties and Applications

Titanium nitride (TiN) as a gate material in BiCMOS devices for biomedical implants

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