2002
DOI: 10.1039/b204027c
|View full text |Cite
|
Sign up to set email alerts
|

Titanium imido complexes as precursors to titanium nitride

Abstract: Treatment of TiCl 4 with 2-4 fold excess of Bu t N(H)SiMe 3 in CH 2 Cl 2 resulted in the formation of orange crystals of [TiCl 2 (NBu t )(NH 2 Bu t )] 4 , the X-ray crystal structure of which has been determined. In the presence of excess pyridine, the reaction of TiCl 4 with 1 equivalent of Bu t N(H)SiMe 3 resulted in the isolation of the monomeric complex [TiCl 2 (NBu t )(py) 3 ]. Low pressure chemical vapour deposition of [TiCl 2 (NBu t )(py) 3 ] forms thin films of titanium nitride (a = 4.23(1) Å, XPS TiN … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

4
36
0

Year Published

2005
2005
2011
2011

Publication Types

Select...
5
2

Relationship

2
5

Authors

Journals

citations
Cited by 43 publications
(43 citation statements)
references
References 24 publications
4
36
0
Order By: Relevance
“…TiCl 4 /NH 3 ) and singlesource precursors, such as amido and imido titanium(IV) compounds. [4][5][6][7] Additionally, we have used silylamines and azides as precursors, which resulted in high quality TiN films, [8][9][10] and this methodology can be extended to other transition metal nitrides. [11] As the understanding of the roles of the precursor have developed, more user-friendly (i.e.…”
Section: Introductionmentioning
confidence: 99%
“…TiCl 4 /NH 3 ) and singlesource precursors, such as amido and imido titanium(IV) compounds. [4][5][6][7] Additionally, we have used silylamines and azides as precursors, which resulted in high quality TiN films, [8][9][10] and this methodology can be extended to other transition metal nitrides. [11] As the understanding of the roles of the precursor have developed, more user-friendly (i.e.…”
Section: Introductionmentioning
confidence: 99%
“…The deposition of transition metal pnictide thin films is a growing area of research, owing mainly to the useful properties of these films, examples being TiN (Carmalt et al, 2002;Newport et al, 2002), ZrN (Potts et al, 2009), TiP (Blackman et al, 2004), TiAs (Thomas, Blackman et al, 2010), CoAs (Senzaki & Gladfelter, 1994;Klingan et al, 1995) and MnAs (Lane et al, 1994). Such films are often grown by chemical vapour deposition (CVD).…”
Section: Commentmentioning
confidence: 99%
“…For example, secondary amines of the type HNtBu-A C H T U N G T R E N N U N G (SiMe 3 ) react readily with TiCl 4 in CH 2 Cl 2 or THF to generate oligomers with a terminal imide group. [87] However, if a donor such as pyridine is used in the reaction, the monomer [Cl 2 (py) 2 Ti=NtBu] can be obtained. [87] .…”
Section: Trimethylsilyl Chloride Elimination Reactionsmentioning
confidence: 99%
“…[87] However, if a donor such as pyridine is used in the reaction, the monomer [Cl 2 (py) 2 Ti=NtBu] can be obtained. [87] . [88] Rupture of the N À Si bond in silazanes concurrent with Ti=N bond formation can also be accomplished with strained systems [89,90] and with the aid of nucleophiles.…”
Section: Trimethylsilyl Chloride Elimination Reactionsmentioning
confidence: 99%
See 1 more Smart Citation