TiO2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition for Rear Surface Passivation of p-PERT Solar Cells

Abstract

The aim of this paper was to analyze the passivation of the rear face of silicon solar cells by TiO 2 thin films produced by atmospheric pressure chemical vapor deposition (APCVD). A compact highthroughput APCVD system was employed to deposit the TiO 2 films. Silicon solar cells with a n + pp + PERT (passivated emitter rear totally-diffused) structure were produced and characterized. The use of TiO 2 on the rear face resulted in a 0.5 mA/cm 2 increase in short-circuit current density and a 0.5% absolute improvement in efficiency compared to devices without a passivation layer. Analyzing the internal quantum efficiency of the devices, we concluded that this economically technique provides passivation on the p + surface, doped with boron, similar to that obtained with thermally grown silicon oxide films.