TiO2 sensoric structures with controlled extension of their active area by electron-beam lithography and reactive ion etching techniques

Nanostructuring of Sno2 Thin Films by Associating Glancing Angle Deposition and Sputtering Pressure for Gas Sensing Applications

“…In particular, the nanostructuring of the sensitive material led to an improvement in detection performance, especially to reach very low detection limits in the ppb level or lower. Several innovative fabrication methods have been developed to produce high sensitive chemical gas sensors with metal oxide nanostructures including bottom-up (chemical vapor deposition (CVD), sol-gel processes, thermal evaporation, hydrothermal route, reactive sputtering) and also top-down approaches (electron-beam lithography, reactive ion etching, field-ion beam technology) [9][10][11][12][13][14]. Recently, the GLancing Angle Deposition method (GLAD) has been applied in reactive sputtering for the growth of different nano-sized columnar films with controlled porosities and shapes [15][16][17].…”

Nanostructuring of SnO2 Thin Films by Associating Glancing Angle Deposition and Sputtering Pressure for Gas Sensing Applications

“…In particular, the nanostructuring of the sensitive material led to an improvement in detection performance, especially to reach very low detection limits in the ppb level or lower. Several innovative fabrication methods have been developed to produce high-sensitive chemical gas sensors with metal-oxide nanostructures, including bottom-up (chemical vapor deposition (CVD), sol-gel processes, thermal evaporation, hydrothermal route, and reactive sputtering) and also top-down approaches (electron-beam lithography, reactive ion etching, field ion beam technology) [9][10][11][12][13][14]. Recently, the Glancing Angle Deposition method (GLAD) has been applied in reactive sputtering for the growth of different nanosized columnar films with controlled porosities and shapes [15][16][17].…”