2019
DOI: 10.1088/1757-899x/503/1/012006
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TiO2 thin films by ultrasonic spray pyrolysis

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Cited by 8 publications
(2 citation statements)
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“…Such ETL implementation into the heterostructures offers a path towards photovoltaic technologies that use relatively simple and near-room fabrication techniques. TiO 2 thin films can be deposited by different techniques such as chemical vapor deposition (CVD), atomic layer deposition (ALD), dip coating, spin coating, spray pyrolysis, e-beam evaporation, and magnetron sputtering [23][24][25][26]. Among them, the method that reports the best results in the aforementioned application is ALD [24,27].…”
Section: Introductionmentioning
confidence: 99%
“…Such ETL implementation into the heterostructures offers a path towards photovoltaic technologies that use relatively simple and near-room fabrication techniques. TiO 2 thin films can be deposited by different techniques such as chemical vapor deposition (CVD), atomic layer deposition (ALD), dip coating, spin coating, spray pyrolysis, e-beam evaporation, and magnetron sputtering [23][24][25][26]. Among them, the method that reports the best results in the aforementioned application is ALD [24,27].…”
Section: Introductionmentioning
confidence: 99%
“…TiO 2 is well-known to exhibit photocatalytic properties for application in antibacterial [ 1 ] and self-cleaning surfaces [ 2 ], degradation of organic pollution [ 3 ], or water splitting [ 4 ]. The TiO 2 coatings have been produced by different methods such as chemical vapour deposition (CVD) [ 5 ], dip-coating [ 6 ] and ultrasonic spray pyrolysis [ 7 ]. All of these approaches in most cases require annealing; thus, the substrates are limited to brittle inorganics.…”
Section: Introductionmentioning
confidence: 99%