TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

Zhao, Chao; Child, David; Gibson, D. R.; Placido, Frank; Fu, Yong Qing

doi:10.1016/j.materresbull.2014.09.022

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Characterisation1

Preparation Of Zno/tio 2 Photoanode1

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Cited by 7 publications

(2 citation statements)

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“…Results and Discussion Fig. 2(a) shows XRD results for a sample deposited at room temperature but enhanced with plasma ion beam set variously at 0.63 mAcm -2 , 0.78 mAcm -2 and 0.93 mAcm -2 [18]. In each case, anatase TiO 2 peaks of 101 were observed increasing in magnitude with increasing ion energy.…”

Section: Characterisationmentioning

confidence: 99%

Control of ordered mesoporous titanium dioxide nanostructures formed using plasma enhanced glancing angle deposition

et al. 2015

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Section: Characterisationmentioning

confidence: 99%

Control of ordered mesoporous titanium dioxide nanostructures formed using plasma enhanced glancing angle deposition

et al. 2015

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“…The ion energy was held constantly by controlling the cathode to anode voltage of 212 V and a plasma current of 21 A. 22 The durations of the depositions were set to be 15, 30, 60, 120, and 240 minutes, which were denoted as samples of TZ1, TZ2, TZ3, TZ4 and TZ5, respectively.…”

Section: Preparation Of Zno/tio 2 Photoanodementioning

confidence: 99%

Low temperature growth of hybrid ZnO/TiO₂ nano-sculptured foxtail-structures for dye-sensitized solar cells

Zhao

Child

et al. 2014

RSC Adv.

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Ion beam assisted electron gun deposition of MgF₂ thin films

Shakoury

Khanlary²,

Sadeghi³

et al. 2022

Vak Forsch Prax

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SummaryA traditional method for increasing the density of the optical films, is heating the substrate. An alternative way to increase the density of the film, is bombardment of substrate by ions during film growth. This method is known as ion assisted deposition (IAD). In this paper, magnesium fluoride, MgF2, thin film has been produced on a glass substrate by ion assisted deposition method. The effects of ion energy have been studied on density and refractive index film. Reflection, transmission and scattering spectra of the samples were measured by a spectrophotometer. Moreover, Atomic force microscope (AFM) is prepared. Using these measurements, optical and physical properties of the films are analyzed. A sample of MgF2 film has been produced without ion bombardment so that one can compare the effect of ion bombardment.

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TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

Cited by 7 publications

References 21 publications

Control of ordered mesoporous titanium dioxide nanostructures formed using plasma enhanced glancing angle deposition

Control of ordered mesoporous titanium dioxide nanostructures formed using plasma enhanced glancing angle deposition

Low temperature growth of hybrid ZnO/TiO₂ nano-sculptured foxtail-structures for dye-sensitized solar cells

Ion beam assisted electron gun deposition of MgF₂ thin films

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TiO 2 films prepared using plasma ion assisted deposition for photocatalytic application

Cited by 7 publications

References 21 publications

Control of ordered mesoporous titanium dioxide nanostructures formed using plasma enhanced glancing angle deposition

Control of ordered mesoporous titanium dioxide nanostructures formed using plasma enhanced glancing angle deposition

Low temperature growth of hybrid ZnO/TiO2 nano-sculptured foxtail-structures for dye-sensitized solar cells

Ion beam assisted electron gun deposition of MgF2 thin films

Contact Info

Product

Resources

About

Low temperature growth of hybrid ZnO/TiO₂ nano-sculptured foxtail-structures for dye-sensitized solar cells

Ion beam assisted electron gun deposition of MgF₂ thin films