TiNi thin films prepared by cathodic arc plasma ion plating

He, Ju-Liang; Won, K.W; Chang, Jing-Tang

doi:10.1016/s0040-6090(99)00720-8

Cited by 27 publications

(8 citation statements)

References 9 publications

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“…Similar plasma hardware is also used for beam-line metal ion implantation as well as for plasma immersion ion implantation ͑PIII͒. [3][4][5][6][7][8] However, a negative feature of the use of this metal plasma formation process is the generation of "macro-particles" from the cathode-roughly micron-size droplets of cathode debris-that can act as a particulate contamination to the plasma stream. Even though the technique has found many applications in metallurgical and tribological applications, the presence of macroparticles has hindered the use of the method in more demanding areas such as microelectronics and optoelectronics.…”

Section: Introductionmentioning

confidence: 99%

Transport efficiency of vacuum arc plasma in a curved magnetic filter

et al. 2005

Review of Scientific Instruments

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We describe two methods for increasing the transmission efficiency of vacuum arc plasma through curved magnetic filters. In the first method the substrate is connected to the anode or biased to a negative voltage. In the second method a metal grid is placed between the substrate and the exit of the magnetic filter, and biased to a positive voltage whereas the substrate is biased negatively. The ion saturation current and electron saturation current of the plasma between the filter exit and the substrate were measured using a current collector plate and a Langmuir probe, respectively, and the ion density estimated. For the experimental conditions of the work described here, the measured ion flux ͑ion saturation current͒ near the duct exit was increased by up to about 80% ͑from 140 to 250 mA͒, and the measured ion density was increased by up to about 40% ͑from 3.7ϫ 10 11 to 5.2 ϫ 10 11 cm −3 ͒. These results can be explained by the ambipolar influence of enhanced electron flow on the accompanying plasma ion component, leading also to enhanced ion flow.

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Section: Introductionmentioning

confidence: 99%

Transport efficiency of vacuum arc plasma in a curved magnetic filter

et al. 2005

Review of Scientific Instruments

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“…Several techniques have been used for the deposition of TiNi SMA thin films, such as sputtering [2,6-10], pulsed laser deposition [11-15], flash evaporation [16], and cathodic arc plasma ion plating [17]. One of the major problems in fabricating TiNi thin films is the composition control.…”

Section: Introductionmentioning

confidence: 99%

Composition and crystalline properties of TiNi thin films prepared by pulsed laser deposition under vacuum and in ambient Ar gas

Nam²,

Alghusun

et al. 2012

Nanoscale Res Lett

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TiNi shape memory alloy thin films were deposited using the pulsed laser deposition under vacuum and in an ambient Ar gas. Our main purpose is to investigate the influences of ambient Ar gas on the composition and the crystallization temperature of TiNi thin films. The deposited films were characterized by energy-dispersive X-ray spectrometry, a surface profiler, and X-ray diffraction at room temperature. In the case of TiNi thin films deposited in an ambient Ar gas, the compositions of the films were found to be very close to the composition of target when the substrate was placed at the shock front. The in-situ crystallization temperature (ca. 400°C) of the TiNi film prepared at the shock front in an ambient Ar gas was found to be lowered by ca. 100°C in comparison with that of a TiNi film prepared under vacuum.

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“…Surface modifications and coating technologies based on the interaction between plasma streams and solid surfaces have been hot spot for a long time, and are currently widely employed in engineering applications [1][2][3][4][5]. Generally, turbulent plasma streams are chosen as the thermal source to heat the solid surface.…”

Section: Introductionmentioning

confidence: 99%

Influence of the processing conditions on the characteristics of the clad layers produced with laminar plasma technology

2006

Applied Surface Science

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Laminar plasma technology was used to produce ceramic hardened layers of Al 2 O 3 -40% mass Ni composite powders on stainless steel substrates. In order to investigate the influences of processing conditions on the morphologies of the surface modified layers, two different powderfeeding methods were tested, one with carrier gas called the powder injection method, and the other without carrier gas called powder transfers method. The microscopic investigations demonstrate that the cross-section of the clad layers consists of two distinct microstructural regions, in which the Al 2 O 3 phases exhibit different growth mechanisms. When the powder transfers method is adopted, the number density and volume fraction of the Al 2 O 3 particles increase considerably and their distributions exhibit zonal periodical characteristics. When the powder-feeding rate increases, the microstructure of the Al 2 O 3 phases changes from a small globular to a long needle shape. Finite element simulations show that the transient thermo-physical features of the pool substances, such as solidification rate and cooling rate, influence strongly the mechanisms of the nucleation and the directional growth of the Al 2 O 3 phases in the thermal processing. #

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TiNi thin films prepared by cathodic arc plasma ion plating

Cited by 27 publications

References 9 publications

Transport efficiency of vacuum arc plasma in a curved magnetic filter

Transport efficiency of vacuum arc plasma in a curved magnetic filter

Composition and crystalline properties of TiNi thin films prepared by pulsed laser deposition under vacuum and in ambient Ar gas

Influence of the processing conditions on the characteristics of the clad layers produced with laminar plasma technology

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