Tin(II) bis(1,3-diketonates) and tin(II) 1,3-diketonate chlorides

Bos, K. D.; Budding, H.A.; Bulten, E.J.; Noltes, J. G.

doi:10.1016/0020-1650(73)80134-5

Cited by 42 publications

(21 citation statements)

References 4 publications

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“…Related chloro(acetylacetonate) compounds have been characterized such as SnCl(acac) and AlCl 2 (acac). 22,23 Additional halo(acetylacetonate) compounds have also been reported such as HfX(acac) 3 , HfX 2 (acac) 2 , ZrX(acac) 3 , and ZrX 2 (acac) 2 where X = Cl or Br. 24,25 For the TMA results displayed in Figure 3, TMA can etch Al 2 O 3 and HfO 2 .…”

Section: Resultsmentioning

confidence: 99%

Selectivity in Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions

2016

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Atomic layer etching (ALE) can result from sequential, selflimiting thermal reactions. The reactions during thermal ALE are defined by fluorination followed by ligand exchange using metal precursors. The metal precursors introduce various ligands that may transfer during ligand exchange. If the transferred ligands produce stable and volatile metal products, then the metal products may leave the surface and produce etching. In this work, selectivity in thermal ALE was examined by exploring tin(II) acetylacetonate (Sn(acac) 2 ), trimethylaluminum (TMA), dimethylaluminum chloride (DMAC), and SiCl 4 as the metal precursors. These metal precursors provide acac, methyl, and chloride ligands for ligand exchange. HF-pyridine was employed as the fluorination reagent. Spectroscopic ellipsometry was used to measure the etch rates of Al 2 O 3 , HfO 2 , ZrO 2 , SiO 2 , Si 3 N 4 , and TiN thin films on silicon wafers. The spectroscopic ellipsometry measurements revealed that HfO 2 was etched by all of the metal precursors. Al 2 O 3 was etched by all of the metal precursors except SiCl 4 . ZrO 2 was etched by all of the metal precursors except TMA. In contrast, SiO 2 , Si 3 N 4 , and TiN were not etched by any of the metal precursors. These results can be explained by the stability and volatility of the possible reaction products. Temperature can also be used to obtain selective thermal ALE. The temperature dependence of ZrO 2 , HfO 2 , and Al 2 O 3 ALE was examined using SiCl 4 as the metal precursor. Higher temperatures can discriminate between the etching of ZrO 2 , HfO 2 , and Al 2 O 3 . The temperature dependence of Al 2 O 3 ALE was also examined using Sn(acac) 2 , TMA, and DMAC as the metal precursors. Sn(acac) 2 etched Al 2 O 3 at temperatures ≥150 °C. DMAC etched Al 2 O 3 at higher temperatures ≥225 °C. TMA etched Al 2 O 3 at even higher temperatures ≥250 °C. The combination of different metal precursors with various ligands and different temperatures can provide multiple pathways for selective thermal ALE.

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Section: Resultsmentioning

confidence: 99%

Selectivity in Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions

2016

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“…In the absence of a single crystal X-ray diffraction analysis of at least one representative compound, it is difficult to comment on the structures of these derivatives, yet spectroscopic investigations together with molecular weight measurements and FAB Mass spectral studies of some of these complexes indicate non-participation of the heteroatom of the ring of the internally functionalised ligand moieties and retention of the cis-configuration around the tin atom in these monomeric complexes. Presence of similar patterns for NMR chemical shifts for bis (acetylacetonato)Sn(L) n Cl 2-n (L = Schiff's bases and oximates) and for bis(acetylacetonato)methyloximatotin(IV) complexes, together with the value of the 119 Sn NMR chemical shift in the range of hexa-coordination, suggest a distorted cis-octahedral environment in these complexes and the following tentative structure may be proposed for these derivatives: (1,2,(5)(6)(7)(8)(9) and L' = Cl (3,4) or Me (10)(11)(12)(13)(14)(15).…”

Section: Discussionmentioning

confidence: 71%

“…[Sn(acac) 2 Cl 2 ] 4,5 and [Sn(acac) 2 IMe] 6 were prepared according to the literature methods. Tin was estimated as tindioxide.…”

Section: Methodsmentioning

confidence: 99%

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Synthesis and Characterisation of some tin(IV) and Methyltin(IV) Complexes with Oximes and Related Schiff's Base Ligands

Agrawal

Sharma

Bohra

2006

Journal of Chemical Research

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A variety of heteroleptic complexes of the type [Sn(acac) 2 Cl 2-n (L) n ] [where L = {O(CH 2 ) 3 N=C(Me)Ar} and {ON =C(R)Ar}; R = Me, H; Ar = 2-C 5 H 4 N, 2-C 4 H 3 O or 2-C 4 H 3 S; n = 1 or 2] have been synthesised in quantitative yields by the metathetical reaction of cis-[Sn(acac) 2 Cl 2 ] with the sodium salt of the ligands in anhydrous methanol-benzene mixture. Corresponding bis(acetylacetonato)methyloximatotin(IV) complexes have also been prepared by a similar reaction of cis-[Sn(acac) 2 IMe] with the potassium salt of the oximes. Absence of any significant shift in the hetero-aryl ring carbon/proton resonances of all the derivatives of internally functionalised ligands indicates nonparticipation of the hetero-atom of the ring on coordination to the tin atom. Spectroscopic data suggest retention of the cis-octahedral configuation for all these derivatives. Hydrolysis of [Sn(acac) 2 {ON=C(Me)C 4 H 3 O}Cl], followed by sintering at 650°C yielded pure SnO 2 microcrystals, which were characterised by XRD and SEM analyses.

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“…The acetylacetonato‐like donors represent one of the most important classes of chelating ligands in the field of coordination chemistry, not only because of their technological applications,1−4 but also for theoretical structural studies performed on their metal complexes 5,6. Several studies have appeared in the literature regarding structural and spectroscopic features of tin(II)7−11 and tin(IV) acetylacetonates,12−23 including their catalytic properties in the formation of polyurethane in foams,24 their promising antineoplastic activity,25−27 and more recently, their use as molecular precursors in LAD (laser ablation and subsequent deposition) technology 28…”

Section: Introductionmentioning

confidence: 99%

A Novel Configuration of a Benzoylacetonato-Diorganotin Species is Modified by an Electron-Withdrawing Substituent on Tin − Synthesis, IR and NMR Spectroscopy, Structure, and ab initio Studies

Pettinari

Marchetti

Pettinari

et al. 2002

Eur. J. Inorg. Chem.

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Keywords: Tin / O ligands / NMR spectroscopy / Crystal structure / Ab initio calculationsDiorganotin(IV) complexes of the β-diketonato benzoylacetonato ligand were synthesized and characterized with IR and multinuclear (H, C, Sn) NMR spectroscopy. The X-ray diffraction study of bis(benzoylacetonato)di-tert-butyltin(IV) shows two independent molecules in the crystallographic unit cell. The metal polyhedron is a distorted octahedral (Skewed Trapezoidal Bipyramidal) with the trans angle C−Sn−C of 151.5(5)°. Each ligand chelates the metal with different donor abilities [Sn−O bond lengths of 2.423(8) Å and 2.135(8) Å in one ligand, and 2.107(9) Å and 2.357(8) Å in the other]; results for the 2nd molecule are similar. The coordination arrangement differs from those of related bis(β-diketonato)diorganotin derivatives containing asymmetric ligands, which are characterized by an approximate C s symmetry, in that both benzoylacetonato ligands point their methyl (and phenyl) substituents across (anti) the metal atom. Chelate planarity and some phenyl-chelate coplanarity was observed. Hartree−Fock (HF) and Density Functional Theory (DFT) calculated structures are in good [a]

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Tin(II) bis(1,3-diketonates) and tin(II) 1,3-diketonate chlorides

Cited by 42 publications

References 4 publications

Selectivity in Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions

Selectivity in Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions

Synthesis and Characterisation of some tin(IV) and Methyltin(IV) Complexes with Oximes and Related Schiff's Base Ligands

A Novel Configuration of a Benzoylacetonato-Diorganotin Species is Modified by an Electron-Withdrawing Substituent on Tin − Synthesis, IR and NMR Spectroscopy, Structure, and ab initio Studies

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