Block copolymer inverse micelles from polystyrene-block-poly-2-vinylpyridine (PS-b-P2VP) deposited as monolayer films onto surfaces show responsive behavior and are reversibly switchable between two states of different topography and surface chemistry. The as-coated films are in the form of arrays of nanoscale bumps, which can be transformed into arrays of nanoscale holes by switching through exposure to methanol. The use of these micellar films to act as switchable etch masks for the structuring of the underlying material to form either pillars or holes depending on the switching state is demonstrated.Block copolymers have been explored extensively as templates for nanofabrication. 1-3 Nanostructures form as a result of the microphase separation driven by chemical incompatibility between the constituent blocks of the copolymer. The morphology and dimensions of the nanostructures thus obtained are tunable with the suitable choice and length of the constituent polymer blocks. Nanoscale polymer etch masks were obtained from microphase-separated block copolymer thin films by selective degradation and removal of one of the blocks, whereas the other block serves as a lithographic mask to etch the underlying substrate. [4][5][6][7] Surface micelles that form through the preferred adsorption of one polymer block onto the surface have also been used to structure surfaces, and the as-coated film offers an inherent mass thickness contrast necessary for transferring structures by etching. 8,9 Block copolymers are furthermore well known to form micelles in solution when dissolved in selective solvents. 10,11 The soluble block forms a swollen corona in the solution phase shielding the insoluble block that forms a highly condensed core. These micelles can be spherical, cylindrical, or wormlike depending on the block ratios, the interfacial energy between the blocks, and the solvent quality. There have been several reports on the deposition of spherical micelles on surfaces to obtain arrays of functional centers that were used for making nanoparticle arrays 12-14 and other functional 15 or responsive 14,16 surfaces.Micellar films loaded with metal salts or nanoparticles derived from them have been used as etch masks to structure the underlying substrate. In the remarkable case of PS-b-P2VP micelles loaded with AuCl 4 -, the authors found an inversion of the relative etch rates upon reducing the included salt to gold nanoparticles, allowing the inversion of the etch contrast depending on the redox state of the mask. 17 We report in this letter the responsive behavior of an amphiphilic diblock copolymer micellar array that can be switched between two complementary surface topographies and polarities by simple means as well as its use as an etch mask for the structuring of the underlying silicon substrate. The complementary topographies obtained from the micellar film lead to complementary topographies in the silicon, resulting in either arrays of pillars or holes depending on the switching state of the micellar film (Figures...