“…More than three decades of research on plasma focus (PF) devices, ranging from low to high energies, has introduced this device as a cost-effective and simple source of intensive ion and electron beams (Stygar et al 1982;Kelly and Marquez 1995;Wong et al 2002;Patran et al 2005;Mohanty et al 2007), soft and hard X-rays (Rawat et al 2004;Wong et al 2004;Neog et al 2006Neog et al , 2008 as well as neutron beams (Verma et al 2008). Due to a wide range of applications of high-energy, short-pulse electron beams in industry and medical sciences, such as lithography, micro-lithography, microscopy (Neff et al 1989;Lee et al 1997;Mohanty et al 2006), sterilization (Kotov and Sokovnin 2000), and deposition of various thin films (Zhang et al 2005), studies have been undertaken to characterize the electron beam emission and its energy spectrum in dense PF devices.…”