Time Resolved Photoluminescence of Si-doped High Al Mole Fraction AlGaN Epilayers Grown by Plasma-Enhanced Molecular Beam Epitaxy

Abstract

We report on detailed temperature dependent, time-resolved photoluminescence (TRPL) studies of Si-doped AlGaN epilayers. In these samples, the Al concentration varies from 25% to 66%. The samples were found to exhibit metallic-like temperature-independent conductivity. The deep level "yellow" emission, whose presence would indicate the existence of a large number of defects associated with growth, Si incorporation, and/or alloy formation, is absent. In addition to emission corresponding to the donor-bound exciton, the PL spectrum exhibits features associated with transitions involving localized carriers. This assignment of the emission mechanisms is based on the activation energies extracted from the temperature dependent photoluminescence (PL) quenching. Specifically, at room temperature the PL spectrum is dominated by transitions involving localized states. The localization energy varied from sample to sample and was observed to be between 115 meV to 200 meV. The PL intensity decay in the lower Al mole fraction epilayers exhibits a slow component associated with the presence of donor-bound excitons.