Time-resolved measurement of film growth during high-power pulsed magnetron sputtering (HIPIMS) of titanium

Mitschker, Felix; Prenzel, Marina; Benedikt, Jan; Maszl, Christian; Keudell, Achim von

doi:10.1088/0022-3727/46/15/155204

Cited by 13 publications

(27 citation statements)

References 16 publications

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“…molybdenum to tailor conductivity [213], or silver to obtain antibacterial properties [214]. For HiPIMS, the plasma composition changes within each pulse as sputtered atoms enter the dense plasma and become ionized [85,186,[215][216][217]. This suggests that bias could be phased with plasma composition to assign higher energy to either the gas or metal, depending on the requirements of the application.…”

Section: Biasingmentioning

confidence: 99%

“…In the case of pulsed cathodic arcs, the ion charge states are enhanced at the beginning of each pulse [90,256], which generally correlates with higher than average kinetic energies. For HiPIMS, each pulse undergoes an evolution from gas-dominated to a metal-dominated plasma, which is well established based on time-resolved optical emission spectroscopy [257,258], mass/charge spectrometry [186,259], spectrally resolved imaging [85,258,260], and last but not least by using a rotating shutter mechanism allowing us to look directly at phased ion impact on film growth [216,217].…”

Section: Energetic Deposition Using Cathodic Arc and Hipims Plasmasmentioning

confidence: 99%

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A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders

2014

Surface and Coatings Technology

234

109

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High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

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Section: Biasingmentioning

confidence: 99%

Section: Energetic Deposition Using Cathodic Arc and Hipims Plasmasmentioning

confidence: 99%

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders

2014

Surface and Coatings Technology

234

109

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“…At the same time, HiPIMS is a pulsed plasma-based process in which pulse width, frequency and amplitude can be controlled independently, i.e., exhibits the potential to generate pulsed fluxes with very well controlled time-domain [65,66]. This paper reviews recent attempts to use pulsed and highly ionized vapour fluxes, primarily generated by HiPIMS discharges, as tools to contribute to the understanding of intrinsic stress generation in polycrystalline films (section 3) and the dynamics of microstructural evolution during three-dimensional (Volmer-Weber) film growth (section 4).…”

Section: Strategies For Generation Of Highly Ionized and Pulsed Vapoumentioning

confidence: 99%

“…Mitschker et al [66] have shown that HiPIMS can generate temporally modulated fluxes while Magnfält et al [16] have shown that the time-domain of Ag fluxes can be controlled by the frequency of the power applied to the sputtering cathode. It was also shown that by keeping the energy during the power pulse constant the temporal profile of the flux can be varied without changing the Ag + IEDFs, i.e.…”

Section: Dynamics Of Microstructural Evolution During Volmer-weber Thmentioning

confidence: 99%

Atomistic view on thin film nucleation and growth by using highly ionized and pulsed vapour fluxes

Sarakinos

Magnfält

Elofsson

et al. 2014

Surface and Coatings Technology

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We present a brief review on the use of ionized and pulsed vapour fluxes, primarily generated by high power impulse magnetron sputtering (HiPIMS) discharges, as tools to gain atomistic understanding on film nucleation and growth. Two case studies are considered; the first case study concerns stress generation in polycrystalline films. It is highlighted that by using vapour fluxes of well-controlled ion content and ion energy and by studying the film microstructure and intrinsic stresses one can obtain experimental evidence for stress generation by insertion of film forming species in the grain boundaries. In the second case study it is discussed how the use of pulsed vapour fluxes with well controlled time domain can facilitate understanding of growth dynamics and microstructural evolution in thin films grown in three-dimensional (i.e., Volmer-Weber) fashion. Broader implications of the described research strategies for the surface science and surface engineering communities are highlighted and discussed.2

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“…Aside from the direct current magnetron sputtering (dcMS), more recently, interest in high‐power impulse magnetron sputtering (HiPIMS) has increased due to beneficial deposition properties (e.g., energy per deposited atom). The plasma dynamics inherent to HiPIMS (e.g., heating, temporal evolution, occurrence and shape of spatial patterns within the plasma, energetic ion groups at the substrate) have been linked to the operating conditions (e.g., gas composition, pressure, discharge current, target material) . In particular, the effects of gas rarefaction induced by an energetic flux of sputtered particles as well as a significant degree of ionization have been found to play an important role in the discharge dynamics and its transition to a metal‐dominated self‐sputtering regime , , .…”

Section: Introductionmentioning

confidence: 99%

Neutral gas simulation on the influence of rotating spokes on gas rarefaction in high‐power impulse magnetron sputtering

Trieschmann

2017

Contributions to Plasma Physics

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High‐power impulse magnetron sputtering (HiPIMS) relies on electrical power deposition constricted to very short time intervals for the generation of intense plasmas. Typically, this leads to a substantial “background gas” rarefaction immanent to the harsh discharge conditions. Experimental observations, in addition, suggest the presence of localized ionization zones rotating in an azimuthal direction, with typical angular frequencies of ωsp ≥ 100 kHz, for example, observed for discharges using small laboratory targets. To understand the gas dynamics within these discharges, a three‐dimensional kinetic neutral particle model, building on the direct simulation Monte Carlo (DSMC) method, is utilized. By considering solely neutral particles, the influence of accompanying plasma phenomena (e.g., depletion due to ionization) is neglected. For a generic discharge setup, the rarefaction and relaxation dynamics of sputtered aluminium and “background” argon is investigated. Subsequently, the implications of a localized rotating sputtering pattern onto the respective transport dynamics are considered. With sole regards to neutral particles, it is found that the presence of fast spoke‐like dynamics is of subordinate relevance due to the inherent collisional and transport time scales. These results present only approximate solutions compared to the case when plasma dynamics are comprehensively considered. The latter scenario, however, is presently inaccessible in terms of three‐dimensional kinetic simulations.

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Time-resolved measurement of film growth during high-power pulsed magnetron sputtering (HIPIMS) of titanium

Cited by 13 publications

References 16 publications

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Atomistic view on thin film nucleation and growth by using highly ionized and pulsed vapour fluxes

Neutral gas simulation on the influence of rotating spokes on gas rarefaction in high‐power impulse magnetron sputtering

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