1990
DOI: 10.1016/0925-4005(90)80231-n
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Time-dependence of the chemical response of silicon nitride surfaces

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Cited by 76 publications
(55 citation statements)
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“…According to refs. [78,79], the slow response and associated hysteresis can be related to buried sites that react slowly due to time needed for diffusion of potential-determining ions in the insulator's sub-surface layer near the electrolyte-insulator interface.…”
Section: Silicon Nitride Filmsmentioning
confidence: 98%
See 1 more Smart Citation
“…According to refs. [78,79], the slow response and associated hysteresis can be related to buried sites that react slowly due to time needed for diffusion of potential-determining ions in the insulator's sub-surface layer near the electrolyte-insulator interface.…”
Section: Silicon Nitride Filmsmentioning
confidence: 98%
“…Analytical applications of EIS sensors with silicon nitride films are hindered by a slow pH response [78,79,80]. According to refs.…”
Section: Silicon Nitride Filmsmentioning
confidence: 99%
“…Also, the passivation layer should be reactive to the change of fluid pH in order to induce generation of accumulation/depletion layer of mobile charge carriers. The roles of passivation layers for electrical insulation, ion-diffusion barrier, and sensing membranes to target chemical species are significant and thus have been numerously discussed in ISFET (Ion Sensitive Field Effect Transistor)-based pH sensors [18][19][20][21][22][23][24][25][26]. However, previous works on SiNW pH sensors have provided only brief accounts for forming thin oxidepassivation layer by oxygen plasma [7] or short-term thermal oxidation [3][4][5]9] without systematic studies of the effect of the materials and thickness on passivation layers.…”
Section: Operating Principle Of Silicon Nanowire-based Ph Sensorsmentioning
confidence: 99%
“…It shows no hydration and no ion diffusion, but there is a slow surface oxidation which leads to a sensitivity degradation with time. The background drift is low, about 0.1 mV/h for nitride deposited by low-pressure chemical vapor deposition (LPCVD) [19], but residual slow-response effects can produce a hysteresis of several mV after a pH excursion.…”
Section: Introductionmentioning
confidence: 99%