2011
DOI: 10.1016/j.apsusc.2011.02.027
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TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage

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Cited by 97 publications
(40 citation statements)
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“…Based on the regression analysis, the TiAlN coating hardness as a function of the substrate bias and the nitrogen flow rate can be predicted using Equation (1 …”
Section: Resultsmentioning
confidence: 99%
“…Based on the regression analysis, the TiAlN coating hardness as a function of the substrate bias and the nitrogen flow rate can be predicted using Equation (1 …”
Section: Resultsmentioning
confidence: 99%
“…TiAlN coatings were deposited on AISI O1 tool steel substrates using a target of Ti 0.5 Al 0.5 by triode magnetron sputtering (TMS) technique in a non-commercial system [22], [23] . A continuous gas flow of argon and nitrogen (Ar+N 2 ) were injected into the chamber for the coatings production.…”
Section: Methodsmentioning
confidence: 99%
“…If the energy level of the ions bombarding the surface is increased, it can generate surface atom desorption. This phenomenon produces surface porosities and defects [23]. The second factor is the increase in the collisions that, depending on to the elemental ionization degree, can cause energy loss allowing the production of neutral particles, making the magnetic field does not affect their movement.…”
mentioning
confidence: 99%
“…Additionally, increases in the roughness and grain size were observed with increasing bias because of the increase in the ion flux/energy that was bombarding the surface. Moreover, a decrease in the hardness and the adherence was observed when the bias voltage was increased because of the decrease in the film density [17]. Although there are many works that present the growth of TiAlN coatings, using several techniques and which study the influence of the deposition parameters, including the bias voltage, the TMS technique has not been commonly used.…”
Section: Introductionmentioning
confidence: 99%