2009
DOI: 10.1002/adfm.200801466
|View full text |Cite
|
Sign up to set email alerts
|

Threshold Voltage Shifts in Organic Thin‐Film Transistors Due to Self‐Assembled Monolayers at the Dielectric Surface

Abstract: Recently, it has been shown by several groups that the electrical characteristics of organic thin‐film transistors (OTFTs) can be significantly influenced by depositing self‐assembled monolayers (SAMs) at the organic semiconductor/dielectric interface. In this work, the effect of such SAMs on the transfer characteristics and especially on the threshold voltage of OTFTs is investigated by means of two‐dimensional drift‐diffusion simulations. The impact of the SAM is modeled either by a permanent space charge la… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

11
114
0

Year Published

2009
2009
2023
2023

Publication Types

Select...
7
1

Relationship

1
7

Authors

Journals

citations
Cited by 103 publications
(126 citation statements)
references
References 43 publications
11
114
0
Order By: Relevance
“…These dipoles, generated at the semiconductor-dielectric interface shift V T positively or negatively based on their direction. The dipoles generated by NH 3 + Cl − ion pair shift V T positively while those generated by COO − K + ion pair shift V T negatively. The ions do not appear to bind to the SiO 2 surface when no peptide is present as there is no change in device performance if the bare SiO 2 / Si substrate is soaked in HCl or KOH solution prior to pentacene and gold evaporation.…”
mentioning
confidence: 99%
See 2 more Smart Citations
“…These dipoles, generated at the semiconductor-dielectric interface shift V T positively or negatively based on their direction. The dipoles generated by NH 3 + Cl − ion pair shift V T positively while those generated by COO − K + ion pair shift V T negatively. The ions do not appear to bind to the SiO 2 surface when no peptide is present as there is no change in device performance if the bare SiO 2 / Si substrate is soaked in HCl or KOH solution prior to pentacene and gold evaporation.…”
mentioning
confidence: 99%
“…Addition of base yielded negative shifts in V T of 5-15 V, larger with increasing basicity, with respect to the initial shift. These shifts can be explained by the presence of ion pairs on the QBP layer such as NH 3 + Cl − or COO − K + dependent on the acidic or basic assembling conditions. Based on the calculations using PROPKA server, 18 the isoelectric point ͑pI͒ of QBP is 6.0, and the pK a s of the C-terminus ͑Ser-12͒, N-terminus ͑Pro-1͒, and side chain group ͑the phenol side chain on tyrosine ͑Tyr-7͒ are 2.9, 6.9, and 13.4, respectively.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…18 In addition, it has been suggested that in thin-film transistors, where the bulk potential is not fixed in contrast to the conventional metal-oxide-semiconductor field-effect transistors (MOS-FET), the band bending is considerably reduced due to the global energy-level shift. 19 If the potential is flat, charge exists only at the interface, and the interface model applies perfectly.…”
Section: Introductionmentioning
confidence: 99%
“…As can be shown by drift-diffusion-based device modelling [19,20], the threshold voltage shift can be associated with a density of fixed charges at the interface (in our case the -SO − 3 groups) via…”
Section: Resultsmentioning
confidence: 99%