2011
DOI: 10.4028/www.scientific.net/kem.495.112
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Threshold Voltage and Sub-Threshold Slope Variation with Gate-Length in Al<sub>2</sub>O<sub>3</sub>/InAlAs/InGaAs Quantum Well (QW) FET's

Abstract: We have theoretically examined the scaling of the Al2O3/InAlAs/InGaAs QW FET one of the proposed III-V channel MOSFET's designed to replace the conventional SiO2/Si structures. To accomplish this we have used a Schroedinger – Poisson – Continuity equation model that is fully 2-dimentional ie all equations are solved along and perpendicular to the channel. We have found out that for the threshold voltage VT to be around zero volts a Schottky barrier ΦΒ of 3.5 - 4.0eV is necessary. Both Cu or W will suffice. for… Show more

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Cited by 3 publications
(3 citation statements)
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“…The method is a wellestablished one. It was originally applied successfully to Si MOSFETS [18][19] and then -accordingly modified-to HEMTS [20][21] and to simple surface channel QW-FETs [22]. It is presented in detail in the next section but an initial justification for its use in nanoscale QW-FETs (as opposed to long-gate ones) is given immediately below.…”
Section: Introductionmentioning
confidence: 99%
“…The method is a wellestablished one. It was originally applied successfully to Si MOSFETS [18][19] and then -accordingly modified-to HEMTS [20][21] and to simple surface channel QW-FETs [22]. It is presented in detail in the next section but an initial justification for its use in nanoscale QW-FETs (as opposed to long-gate ones) is given immediately below.…”
Section: Introductionmentioning
confidence: 99%
“…Στην παρούσα εργασία επιλύονται αυτοσυνεπώς σε δύο διαστάσεις οι τρείς διαφορικές εξισώσεις Poisson, Schroedinger και Continuity για την ανάλυση των QW-FETs. Η μέθοδος είχε αρχικά εφαρμοστεί με επτυχία σε Si MOSFETS [46][47] και στη συνέχεια τροποποιήθηκε για χρήση σε HEMTs [48][49] και σε απλά QW-FETs [50] καναλιού επιφανείας.…”
Section: (γ)unclassified
“…Θα αναλυθούν τρείς διατάξεις (βλ.Σχήμα 4.1). Μία μεγάλου καναλιού με μήκος καναλιού Lg=200nm [32], μία μικρού καναλιού Lg=30nm [36] και μία θεωρητική με μήκος καναλιού Lg=65nm [50] για την οποία όμως δεν υπάρχουν πειραματικά δεδομένα. Η μέθοδος που αρχικά είχε χρησιμοποιηθεί σε Si-MOSFETs θα χρησιμοποιηθεί σε αυτήν την εργασία σε QW-FETs πολλών στρωμάτων.…”
Section: μέθοδοςunclassified