Three terminal capacitance technique for magnetostriction and thermal expansion measurements

Kundys, B.; Bukhantsev, Yu.; Vasiliev, S.; Kundys, Dmytro; Berkowski, M.; Dyakonov, V.

doi:10.1063/1.1753088

Cited by 31 publications

(23 citation statements)

References 25 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…The electrical contacts to the sample were made using a conductive silver paste. The magnetostriction was measured (from 6T to -6T) using a three terminal capacitance dilatometer technique [30] in a PPMS cryostat.…”

Section: Thementioning

confidence: 99%

Magnetic field induced ferroelectric loop in Bi0.75Sr0.25FeO3−δ

Kundys

Maignan

Martin

et al. 2008

Applied Physics Letters

View full text Add to dashboard Cite

Magnetic field induced ferroelectric hysteresis loop observed in Bi 0.75 Sr 0.25 FeO 3-delta is of prime importance. The coexistence of antiferromagnetism and weak ferromagnetism is responsible for the original magnetoelastic and magnetoferroelectric properties. Upon external magnetic field application, the existence of a magnetostrictive effect supports a structural transition towards a homogeneous antiferromagnetic and ferroelectric phase. The magnetic field induced polarization is among the highest reported for BiFeO 3 based systems in either thin film or bulk forms (Pr=96µC/cm 2 at 10T) while the ferroelectric coercive field is among the lowest reported (Hc=661(V/cm) at 10T). These properties make this material very attractive for technical applications.

show abstract

Section: Thementioning

confidence: 99%

Magnetic field induced ferroelectric loop in Bi0.75Sr0.25FeO3−δ

Kundys

Maignan

Martin

et al. 2008

Applied Physics Letters

View full text Add to dashboard Cite

show abstract

“…However in the case of a disc shaped sample, this assumption is not valid and curvature across the width of the sample cannot be ignored. The sample will not be under uniaxial stress and so capacitive measurements have limited applications for thin film wafers [5,[16][17][18][19].…”

Section: Introductionmentioning

confidence: 99%

Whole wafer magnetostriction metrology for magnetic films and multilayers

Hill

Hendren

Bowman

et al. 2013

Meas. Sci. Technol.

View full text Add to dashboard Cite

The requirements for metrology of magnetostriction in complex multilayers and on whole wafers present challenges. An elegant technique based on radius of curvature deformation of whole wafers in a commercial metrology tool is described. The method is based on the Villari effect through application of strain to a film by introducing a radius of curvature. Strain can be applied tensilely and compressively depending on the material. The design, while implemented on 3" wafers, is scalable. The approach removes effects arising from any shape anisotropy that occurs with smaller samples, which can lead to a change in magnetic response. From the change in the magnetic anisotropy as a function of the radius, saturation magnetostriction  s can be determined. Dependence on film composition and film thickness was studied to validate the radius of curvature approach with other techniques.  s decreases from positive values to negative values through an increase in Ni concentration around the permalloy composition, and  s also increases with a decrease in film thickness; in full agreement with previous reports. We extend the technique by demonstrating the technique applied to a multilayered structure. These results verify the validity of the method and are an important step to facilitate further work in understanding how manipulation of multilayered films can offer tailored magnetostriction.

show abstract

“…Several decades ago, dynamic measurement was also used to investigate magnetostrictive Terfenol-D alloys to show their potential as transducers. These measurements were performed either with a strain gauge [63][64][65], an accelerometer [66], a laser-Dopplervibrometry system [67,68] or by using a three-terminal capacitance technique [69].…”

Section: Introductionmentioning

confidence: 99%

Dynamic Magnetostriction of CoFe2O4 and Its Role in Magnetoelectric Composites

et al. 2018

View full text Add to dashboard Cite

Applications of magnetostrictive materials commonly involve the use of the dynamic deformation, i.e., the piezomagnetic effect. Usually, this effect is described by the strain derivative ∂λ=∂H, which is deduced from the quasistatic magnetostrictive curve. However, the strain derivative might not be accurate to describe dynamic deformation in semihard materials as cobalt ferrite (CFO). To highlight this issue, dynamic magnetostriction measurements of cobalt ferrite are performed and compared with the strain derivative. The experiment shows that measured piezomagnetic coefficients are much lower than the strain derivative. To point out the direct application of this effect, low-frequency magnetoelectric (ME) measurements are also conducted on bilayers CFO=PbðZr; TiÞO 3 . The experimental data are compared with calculated magnetoelectric coefficients which include a measured dynamic coefficient and result in very low relative error (<5%), highlighting the relevance of using a piezomagnetic coefficient derived from dynamic magnetostriction instead of a strain derivative coefficient to model ME composites. The magnetoelectric effect is then measured for several amplitudes of the alternating field H ac , and a nonlinear response is revealed. Based on these results, a trilayer CFO/PbðZr; TiÞO 3 /CFO is made exhibiting a high magnetoelectric coefficient of 578 mV=A (approximately 460 mV=cm Oe) in an ac field of 38.2 kA=m (about 48 mT) at low frequency, which is 3 times higher than the measured value at 0.8 kA=m (approximately 1 mT). We discuss the viability of using semihard materials like cobalt ferrite for dynamic magnetostrictive applications such as the magnetoelectric effect.

show abstract

Three terminal capacitance technique for magnetostriction and thermal expansion measurements

Cited by 31 publications

References 25 publications

Magnetic field induced ferroelectric loop in Bi0.75Sr0.25FeO3−δ

Magnetic field induced ferroelectric loop in Bi0.75Sr0.25FeO3−δ

Whole wafer magnetostriction metrology for magnetic films and multilayers

Dynamic Magnetostriction of CoFe2O4 and Its Role in Magnetoelectric Composites

Contact Info

Product

Resources

About