The role of the point-defect scattering relaxation rate has been studied in the lattice thermal conductivity of ah insulator by calculating the lattice thermal conductivity of GaAs for the different va]ues of the point-defect scattering strength. All calculations have been pcrformed in the frame of the recently proposed model of DuB~,Y and MISHO of the phonon conductivity of an insulator. The study is made for low as well as high values of the point-defcct scattering strength in the entire temperature range 4--100 K.The lattice thermal resistivity of ma insulator has been studied by several workers and is found that the transportation of heat by lattice waves in a solid is governed by the anharmonicities of the lattice forees such as various imperfections of the crystal lattice and by the external boundary. It is well known [1--4] that the point-defects (isotopic impurities) are one of the very important seatterers of phonons at temperatures near the conductivity maxima, and the lattice thermal resistivity of an insulator is mainly due to the point-defeet seattering relaxation tate at these temperatures. Thus, there is a need to study the role of the point-defect seattering relaxation tate in the caleulation of the lattiee thermal conduetivity. Reeently, the authors [4, 6] studied the phonon eonductivity of GaAs in the entire temperature rmage 2--800 K. But their studies ate eonfined to see the tole of the three phonon and boundary scattering processes only, while the study of the tole of the point-defeet seattering has been totally ignored in their previous studies. In eontinuation of the earlier study, the airo of the present note is to study the tole of the point-defect seattering relaxation rate in the ealeulation of the lattice thermal eonductivity.The study is performed by introducing a new parameter "p" whieh is the ratio of the point-defeet seattering strengths of the normal sample and the sample under study (having ah impurity coneentration different from the normal sample), similar to the previous study of the tole of the boundary scattering [6]. The new parameter "p" can be defined as p = (point-defect seattering strength for the sample under study)/(point-defect seattering strength of the normal sample) and it depends totally on the extra impurities present in the normal sample. GaAs is taken as ma example mad its lattice thermal eonduc-4* .Acta Physir A~miae Sr II~~'ir 46 1979