2021
DOI: 10.3390/eng2040039
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Three-Dimensional TID Hardening Design for 14 nm Node SOI FinFETs

Abstract: The fin field-effect transistor (FinFET) has been the mainstream technology on the VLSI platform since the 22 nm node. The silicon-on-insulator (SOI) FinFET, featuring low power consumption, superior computational power and high single-event effect (SEE) resistance, shows advantages in integrated circuits for space applications. In this work, a rad-hard design methodology for SOI FinFETs is shown to improve the devices’ tolerance against the Total Ionizing Dose (TID) effect. Since the fin height direction enab… Show more

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Cited by 10 publications
(7 citation statements)
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“…Currently, the impact of radiation on semiconductors has a tradeoff relationship between the SEE and the TID effect, and recently, based on simulations, research has been actively conducted on tolerance technologies of these two effects for advanced transistors in nanoscale process [12], [20]. This article proposed a technology that can simultaneously ensure resistance to two types of radiation effects in a submicrometer process that can be fabricated on a chip and verified its feasibility.…”
Section: Discussionmentioning
confidence: 99%
“…Currently, the impact of radiation on semiconductors has a tradeoff relationship between the SEE and the TID effect, and recently, based on simulations, research has been actively conducted on tolerance technologies of these two effects for advanced transistors in nanoscale process [12], [20]. This article proposed a technology that can simultaneously ensure resistance to two types of radiation effects in a submicrometer process that can be fabricated on a chip and verified its feasibility.…”
Section: Discussionmentioning
confidence: 99%
“…The minimum delta (δ) in Equation ( 3) can be used to determine the chosen parameters without considering kink effects, which are listed in Table 1 [8]. In the table, the minimum delta at different gate biases requires different k n , lambda (λ), and threshold voltages.…”
Section: Applicationmentioning
confidence: 99%
“…Therefore, current-versus-voltage characteristic curves showing the electrical performances of transistors are necessarily parameter-extracted in the model. Nevertheless, researchers are still intrigued to know if the "modified" conventional formula is applicable for fitting repeated characteristic curves [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. Useful parameters are supposed to be constants in the model, even though they need interpreting.…”
Section: Introductionmentioning
confidence: 99%
“…The achievable function of the process is mostly due to the good conformality (step coverage) of chemical vapor deposition, in which SiH4 (silane) is controlled at a chosen flow rate and the ambient is sustained at an appropriate temperature and at certain pressure to achieve a good deposition rate in kinetic regime. [7][8][9][10][11][12][13][14][15] Somehow, the electrical performances of transistors are mainly manifested in current-versusvoltage characteristic curves. Those curves are necessarily parameter-extracted in the model, which is useful to develop circuit design.…”
Section: Introductionmentioning
confidence: 99%