Three-Dimensional Optical Circuits Consisting of Waveguide Films and Optical Z-Connections

Yoshimura, Tetsuzo; Miyazaki, Masayoshi; Miyamoto, Yoshihisa; Shimoda, Noriyuki; Hori, Atsuhiro; Asama, K.

doi:10.1109/jlt.2006.883679

Cited by 27 publications

(11 citation statements)

References 12 publications

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“…Since optical interconnects are promising to overcome these bottlenecks [65,66], comprehensive accomplishments to implement optics into computers have been done [67][68][69][70][71][72][73][74]. Figure 8.41 shows a concept of the 3D integrated optical interconnects within computers, which we expect to be the final goal of optical interconnects [12,52,[75][76][77][78]. Optical waveguide films, in which thin-film light modulator/PD flakes are embedded, are stacked together with films containing thinned LSIs.…”

Section: Three-dimensional Integrated Optical Interconnects Within Comentioning

confidence: 99%

Thin‐Film Molecular Nanophotonics

Yoshimura

2015

Photonics

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Section: Three-dimensional Integrated Optical Interconnects Within Comentioning

confidence: 99%

Thin‐Film Molecular Nanophotonics

Yoshimura

2015

Photonics

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“…It consists of two parts with refractive indices of 1.5196 and 1.4908 for the waveguide core and cladding. In order to have the beam traveling inside the polymer waveguide core layer at an angle greater than 41º, i.e., with 45º, a prism can be used on top of the polymer core layer to couple light through [14]. However, there are some practical problems in using prism for the micro-mirror integrated on polymer waveguides on PCB substrates.…”

Section: Designing Issuesmentioning

confidence: 99%

45 Degree polymer micro-mirror integration for board-level three-dimensional optical interconnects

Martínek

Liu

Adibi

2009

2009 59th Electronic Components and Technology Conference

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We introduced here a novel method to fabricate polymer optical waveguides with integrated 45º total internal reflection (TIR) micro-mirrors by contact photolithography on printed circuit boards (PCBs) to achieve fully embedded optical interconnects. The 45º TIR mirrors were shaped at the ends of the waveguides in one step to provide surface normal light coupling between waveguides and optoelectronic devices. A tank of de-ionized (D.I.) water is used to couple the ultraviolet (UV) exposure beam through the core polymer layer at 45º angle during the contact photolithography process, and then the 45 mirror facet will be formed after the post-process. Compared to the conventional glass prismpolymer coupling interface, this novel water-polymer interface provides a simple, convenient, and cost efficient solution. This technique is not only compatible with PCB manufacturing facility and technology, but also suitable to large panel board-level manufacturing for optical interconnects. The 45º angle can be controlled with an accuracy of ±1º and has a high reproducibility. The average insertion loss of the 45º TIR uncoated mirrors is around 1.6dB. IntroductionThe ever-increasing need for higher bandwidth and density is one of the motivations for extensive research on planar optoelectronic structures on PCB substrate [1]. Among many applications, optical interconnects [2] have gotten considerable attention in the last decade. In all planar optoelectronic systems, optical waveguides are crucial elements that facilitate signal rooting. As an example, integration of optical waveguides and polymer passive devices on high density PCB substrate is a major area of research in optoelectronics. Low propagation loss, high optical quality, and manufacturability are among the requirements of polymer optical waveguides and polymer passive devices on PCB substrates for practical applications. In three-dimensional fully embedded board-level optical interconnects, another key challenge is to realize efficient optical coupling between in-plane waveguides and laser/detector devices. The 45º TIR micro-mirrors and grating devices [3] integrated on the waveguide have been studied as the surface normal couplers. 45º total internal reflection (TIR) mirror couplers are more widely employed as waveguide couplers compared with the grating couplers, because they are coupling-efficient, easy to fabricate, and relatively insensitive to wavelength variations.Various techniques can be used to construct such 45º TIR micro-mirrors, such as laser ablation [4][5][6], grayscale lithography [7], hard molding [8], soft molding [9], reactive ion etching (RIE) [10], micro-dicing [11], and the X-ray

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“…1. [1][2][3][4][5] In the OE board, optical waveguide films with 45 o mirrors are stacked. In the films thin-film devices such as light modulators, VCSELs, and PDs are embedded.…”

Section: Integrated Optical Interconnectsmentioning

confidence: 99%

“…Three-dimensional (3D) optical wiring [1][2][3][4][5] is applicable to integrated optical interconnects and solar energy conversion systems. The 3D architecture is based on device-embedded optical waveguide films with 45 o mirrors of core end facets.…”

Section: Introductionmentioning

confidence: 99%

Optical waveguide films with two-layer skirt-type core end facets for beam leakage reduction at 45° mirrors

et al. 2008

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Three-dimensional optical wiring, consisting of stacked optical waveguide films with 45 o mirrors, is a backbone for integrated optical interconnects and solar energy conversion systems. By using the self-organized lightwave network (SOLNET) technique, we observed leakage/scattering of guided light beams at 45 o mirrors of core end facets in optical waveguide films. When 405-nm write beams were introduced into the optical waveguide having a photo-refractive material layer on the back, three excess lines of SOLNET, which may be caused by the guided beam tunneling into the cladding film and by the refraction at core end facet corners, were grown from the 45 o mirror, in addition to a vertical waveguide of SOLNET formed by reflected beams. To reduce the leakage/scattering, we proposed the two-layer skirttype cores with low-index (LI) part and high-index (HI) part. The LI part located between the HI part and the cladding film prevents the guided beams from tunneling into the film. The skirt-type core end facets put the corners away from the beam path. These effects were confirmed by simulations using the beam propagation method and the finite difference time domain method. Optical waveguide films with the proposed structure were fabricated by the built-in mask method.

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Three-Dimensional Optical Circuits Consisting of Waveguide Films and Optical Z-Connections

Cited by 27 publications

References 12 publications

Thin‐Film Molecular Nanophotonics

Thin‐Film Molecular Nanophotonics

45 Degree polymer micro-mirror integration for board-level three-dimensional optical interconnects

Optical waveguide films with two-layer skirt-type core end facets for beam leakage reduction at 45° mirrors

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